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X-Ray Stress Studies of Passivated and Unpassivated Narrow Aluminum Metallizations

Published online by Cambridge University Press:  16 February 2011

C. A. Paszkiet ,
M. A. Korhonen  and
Che-Yu Li
C. A. Paszkiet
Affiliation:
Department of Materials Science and Engineering, Bard Hall, Cornell University, Ithaca, New York 14853
M. A. Korhonen
Affiliation:
Department of Materials Science and Engineering, Bard Hall, Cornell University, Ithaca, New York 14853
Che-Yu Li
Affiliation:
Department of Materials Science and Engineering, Bard Hall, Cornell University, Ithaca, New York 14853
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Abstract

Stresses in thin narrow textured metal lines were measured using x-ray diffraction techniques. Arrays of 1.5μm wide, 0.32μm thick aluminum lines, both with and without a 0.32μm thick SiNx passivation layer, were heat-treated at 400°C in a hydrogen/nitrogen atmosphere. After heat treatment the lines were examined periodically using chromium radiation to monitor the relaxation of the stress developed during heat treatment. The apparent stress in both the passivated and unpassivated lines relaxed significantly over the measurement period of three days. The higher stresses present in the passivated lines may be partially responsible for the voids which were found after aging at room temperature.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 188: Symposium K – Thin Films: Stresses and Mechanical Properties II , 1990 , 153
Copyright
Copyright © Materials Research Society 1990

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References

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