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X-Ray Photoelectron Spectroscopy Investigation of the Interaction of NF3 with Silicon

  • T. W. Little (a1) and F. S. Ohuchi (a1)

Abstract

The interaction of nitrogen trifluoride (NF3) with silicon (Si) surfaces has been investigated by x-ray photoelectron spectroscopy (XPS). Si (100) surfaces were subjected to NF3 ion bombardment as a means of approximating plasma processing under controlled conditions. Samples were also exposed to actual NF3 DC plasmas and the results compared to ion beam and plasma processing using nitrogen (N2). The results indicate that nitridation of silicon is possible using NF3 although it seems to be limited by simultaneous etching. Additionally, results suggest bonding between both Si-F and Si-N species and perhaps F-N-Si moieties. NF3 plasma processing has lead to curious results for F 1s spectra which are not fully understood at present.

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X-Ray Photoelectron Spectroscopy Investigation of the Interaction of NF3 with Silicon

  • T. W. Little (a1) and F. S. Ohuchi (a1)

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