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Volatile, Fluorine-Free β-Ketoiminate Precursors for MOCVD Growth of Lanthanide Oxide Thin Films

Published online by Cambridge University Press:  10 February 2011

N.L. Edleman ,
J.A. Belot ,
J.R. Babcock ,
A.W. Metz ,
M.V. Metz ,
C.L. Stern  and
T.J. Marks
N.L. Edleman
Affiliation:
Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Rd., Evanston, IL 60208-3113
J.A. Belot
Affiliation:
Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Rd., Evanston, IL 60208-3113
J.R. Babcock
Affiliation:
Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Rd., Evanston, IL 60208-3113
A.W. Metz
Affiliation:
Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Rd., Evanston, IL 60208-3113
M.V. Metz
Affiliation:
Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Rd., Evanston, IL 60208-3113
C.L. Stern
Affiliation:
Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Rd., Evanston, IL 60208-3113
T.J. Marks
Affiliation:
Department of Chemistry and the Materials Research Center, Northwestern University, 2145 Sheridan Rd., Evanston, IL 60208-3113, tjmarks@casbah.acns.nwu.edu
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Abstract

Lanthanide oxide thin films are of increasing scientific and technological interest to the materials science community. A new class of fluorine-free, volatile, low-melting lanthanide precursors for the metal-organic chemical vapor deposition (MOCVD) of these films has been developed. Initial results from a full synthetic study of these lanthanide-organic complexes are detailed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 623: Symposium U – Materials Science of Novel Oxide-Based Electronics , 2000 , 371
Copyright
Copyright © Materials Research Society 2000

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