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VHF-GD a-Si:H Films Prepared at Very Low Temperature

  • Y. Ziegler (a1), H. Curtins (a1), J. Baumann (a2) and A. Shah (a1)

Abstract

Structural, optical and electrical properties of a-Si:H films prepared with the VHF Glow Discharge system were studied as function of deposition temperature, particularly in the range below 100°C. Usually, this material has poor optoelectronic properties. The a-Si:H material discussed in this work shows a surprisingly low hydrogen content, a low dihydride to monohydride ratio, good optical and electrical properties.

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