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UV Laser Ablation of Ferroelectrics

Published online by Cambridge University Press:  26 February 2011

R. F. Haglund Jr. ,
J. H. Arps ,
K. Tang ,
A. Niehof  and
W. Heiland
R. F. Haglund Jr.
Affiliation:
Haglund, Arps and Tang Department of Physics and Astronomy, Vanderbilt University, Nashville, TN 37235
J. H. Arps
Affiliation:
Haglund, Arps and Tang Department of Physics and Astronomy, Vanderbilt University, Nashville, TN 37235
K. Tang
Affiliation:
Haglund, Arps and Tang Department of Physics and Astronomy, Vanderbilt University, Nashville, TN 37235
A. Niehof
Affiliation:
Niehof and Heiland FB Physik, Barbarastraße 7, Universität Osnabrück, D-4500 Osnabrück, Germany
W. Heiland
Affiliation:
Niehof and Heiland FB Physik, Barbarastraße 7, Universität Osnabrück, D-4500 Osnabrück, Germany
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Abstract

We have investigated laser ablation of excited atoms from the ferroelectrics LiNbO3 and KNbO3 at 308 nm. Comparisons of the yields for O*, K* and Nb* from pure and undoped KNbO3 show the effects of changing intensity, surface condition and irradiation time on the yield of excited atoms. Below about 20 GW cm−2, the mechanisms for production of excited atoms differ among the various species; above that intensity, the production of a dense electron-hole plasma appears to impart a collective character to the ablation mechanism.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 201: Symposium A – Surface Chemistry and Beam-Solid Interactions , 1990 , 507
Copyright
Copyright © Materials Research Society 1991

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