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The Use of Fresnel Contrast to Study the Initial Stages of The in situ Oxidation of Silicon

  • Frances M. Ross (a1), J. Murray Gibson (a2) and W. M. Stobbs (a1)

Abstract

We describe the analysis of Fresnel contrast seen at a free silicon surface in order to characterise the initial clean surface and the formation in situ of the first atomic layers of oxide.

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The Use of Fresnel Contrast to Study the Initial Stages of The in situ Oxidation of Silicon

  • Frances M. Ross (a1), J. Murray Gibson (a2) and W. M. Stobbs (a1)

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