Hostname: page-component-8448b6f56d-jr42d Total loading time: 0 Render date: 2024-04-24T17:29:22.818Z Has data issue: false hasContentIssue false

Undoped gallium antimonide studied by positron annihilation spectroscopy

Published online by Cambridge University Press:  01 February 2011

S. K. Ma
Affiliation:
Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong, China
C. C. Ling*
Affiliation:
Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong, China
H. M. Weng
Affiliation:
Department of Modern Physics, University of Science and Technology of China, Hefei, China
D. S. Hang
Affiliation:
Department of Physics, Nanjing University, Nanjing, China
*
* e-mail correspondence: ccling@hku.hk
Get access

Abstract

Positron lifetime spectroscopy has been used to study the vacancy type defects in undoped gallium antimonide. Temperature dependent positron trapping into the VGa-related defect having a characteristic lifetime of 310ps was observed in the as-grown sample. The lifetime data were well described by a model involving the thermal ionization (0/-) of the VGa-related defect and its ionization energy was found to be E(0/-)=83meV. For the electron irradiated sample, the VGa-related defect with lifetime of 310ps that was found in the non-irradiated samples was also identified. Moreover, another lifetime component (280ps) was only observed in the electron irradiated sample but not in the non-irradiated sample. It was also attributed to the VGa-related defect. The two identified VGa-related defects should have different microstructures because of their difference in characteristic lifetimes. The 280ps component remains thermally stable after the 500°C annealing while the 310ps component anneals at 300°C.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Milnes, A.G. and Polyakov, A.Y., Solid-State Electron. 36, 803 (1993).Google Scholar
[2] Dutta, P.S. and Bhat, H.L., J. Appl. Phys. 81, 5821 (1997).Google Scholar
[3] Effer, D. and Effer, P.J., J. Phys. Chem. Solids 25, 451 (1964).Google Scholar
[4] Johnson, E.J., Fillinski, I., and Fan, H.Y., in Proceedings of the 6th International Conference on Physics of Semiconductors, 1962, p. 375.Google Scholar
[5] D'Olne Campos, M., Gouskov, A., Gouskov, L., and Pons, J.C., J. Appl. Phys. 44, 2642 (1973).Google Scholar
[6] Krause-Rehberg, R. and Leipner, H. S., Positron Annihilation in Semiconductors, Defect Studies, Vol. 127 of Springer Series in Solid-State Sciences (Springer-Verlag, Berlin, 1999).Google Scholar
[7] Puska, M.J., Mäkinen, S., Manninen, M. and Nieminen, R.M., Phys. Rev. B 39, 7666 (1989).Google Scholar
[8] Mahony, J., Tessaro, G., Mascher, P., Siethoef, H., and Brion, H.G., Mater. Sci. Forum 196–201, 1449 (1995).Google Scholar
[9] Dannefaer, S., Puff, W., and Kerr, D., Phys. Rev. B 55, 2182 (1997).Google Scholar
[10] Ling, C. C., Fung, S. and Beling, C. D., Phys. Rev. B 64, 075201 (2001).Google Scholar
[11] Ling, C. C., Mui, W. K., Lam, C. H., Beling, C. D., Fung, S., Lui, M. K., Cheah, K. W., Li, K. F., Zhao, Y. W. and Gong, M., Appl. Phys. Lett. 80, 3934 (2002).Google Scholar
[12] Kirkegaard, P., Eldrup, M., Mogenson, O.E., and Pederson, N.J., Comput. Phys. Commun. 23, 307 (1981).Google Scholar
[13] Puska, M. J., Corbel, C., and Nieminen, R. M., Phys. Rev. B 41, 9980 (1990)Google Scholar
[14] Krasue-Rehberg, R., Drost, Th., Polity, A., Ross, G., Pensl, G., Volm, D., Meyer, B. K., Bischopink, G. and Benz, K. W., Phys. Rev. B 48, 11723 (1993).Google Scholar
[15] Shaw, D., Semicond. Sci. Technol. 18, 627 (2003)Google Scholar
[16] Lui, M. K., Ling, C. C., Chen, X. D., Cheah, K. W., Li, K. F., presented in MRS Fall Meeting 2003.Google Scholar