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Ultrafine Silicon Nano-wall Hollow Needles and Applications in Inclination Sensor and Gas Transport

Published online by Cambridge University Press:  20 January 2011

Z. Sanaee ,
S. Mohajerzadeh ,
M. Mehran  and
M. Araghchini
Z. Sanaee
Affiliation:
Nanoelectronic Center of Excellence, Thin Film and Nano-Electronic Laboratory, School of Electrical & Computer Engineering, University of Tehran, Tehran, Iran
S. Mohajerzadeh
Affiliation:
Nanoelectronic Center of Excellence, Thin Film and Nano-Electronic Laboratory, School of Electrical & Computer Engineering, University of Tehran, Tehran, Iran
M. Mehran
Affiliation:
Nanoelectronic Center of Excellence, Thin Film and Nano-Electronic Laboratory, School of Electrical & Computer Engineering, University of Tehran, Tehran, Iran
M. Araghchini
Affiliation:
Nanoelectronic Center of Excellence, Thin Film and Nano-Electronic Laboratory, School of Electrical & Computer Engineering, University of Tehran, Tehran, Iran
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Abstract

We report on the realization of high precision hollow structures directly on silicon suitable for liquid and gas/vapor transport. The formation of hollow structures requires high aspect ratio etching combined with bulk back-side micro-machining to realize silicon-based membranes. The use of a slant angle deposition method has been used as an alternative method for three-dimensional lithography. The transfer of acetone vapor through such tiny holes shows an anomalous behavior where a sharp rise is observed followed by an exponential and gradual decay. These structures can be eventually used as mass ion separation devices.

Keywords

microelectro-mechanical (MEMS)microstructurereactive ion etching
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1299: Symposium S – Microelectromechanical Systems—Materials and Devices IV , 2011 , mrsf10-1299-s05-05
Copyright
Copyright © Materials Research Society 2011

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References

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