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Transient Photocurrent Measurements on Current-Stressed a-Si:H Schottky Diodes

Published online by Cambridge University Press:  15 February 2011

Andreas A. Buykx
Affiliation:
Faculty of Electrical Engineering, ECTM group, Delft University of Technology, P.O. Box 5031, 2600 GA Delft, The Netherlands
M. Zeman
Affiliation:
Faculty of Electrical Engineering, ECTM group, Delft University of Technology, P.O. Box 5031, 2600 GA Delft, The Netherlands
A. J. G. Spiekerman
Affiliation:
Faculty of Electrical Engineering, ECTM group, Delft University of Technology, P.O. Box 5031, 2600 GA Delft, The Netherlands
J. W. Metselaar
Affiliation:
Faculty of Electrical Engineering, ECTM group, Delft University of Technology, P.O. Box 5031, 2600 GA Delft, The Netherlands
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Abstract

The characteristics of a-Si:H based switches, as used in liquid crystal displays, degrade as a result of current injection. To assess this degradation we investigated the effects of current injection on the electron mobility, lifetime and the built-in electric field profile in a-Si:H Schottky diodes.

We present steady-state current-voltage and transient photocurrent (TP) measurements on Mo and Pd a-Si:H Schottky diodes. The mobility, lifetime and electric field profile were determined from TP measurements. The electric field profile was calculated by fitting simulations from a non-linear model of the measurement to the measured TP currents.

The electron drift mobility is not affected by current stressing, the electron lifetime reduces slightly, the built-in voltage decreases significantly. The widths of the built-in fields of Schottky and ohmic back contact are reduced with approximately the same factor, corresponding with a spatially homogeneous increase of the defect density.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

REFERENCES

[1] Smith, Z.E. and Wagner, S., volume A of Amorphous silicon and related materials, pages 409 - 460. J. Wiley &s., 1988.Google Scholar
[2] Nieuwesteeg, K.J.B.M., Boogaard, J., and Oversluizen, G.. In Thompson, M.J., Hamakawa, Y., LeComber, P.G., Madan, A., and Schiff, E., editors, Amorphous Silicon Technology, volume 258 of Mat. Res. Soc. Conf. Proc, pages 479484, 1992.Google Scholar
[3] Vanderhaghen, R.. Phys. Rev. B, 38 (15) : 10755–75, 1988.Google Scholar
[4] Street, R.A.. Phys. Rev. B, 27 (8): 4924 - 4932, 1983.Google Scholar
[5] Dietrich, K.. PhD thesis, T.U. München, 1991.Google Scholar
[6] Wyrsch, N. and Shah, A.. Jrnl. Non-Cryst. Sol., 137&138: 431, 1991.Google Scholar
[7] Vanderhaghen, R. and Longeaud, C.. In Madan, A., Thompson, M.J., Taylor, P.C., Hamakawa, Y., and Le Comber, P.G., editors, Amorphous Silicon Technology, volume 149 of Mat. Res. Soc. Conf. Proc., pages 357 - 362, 1989.Google Scholar
[8] Ouwerling, G.J.L., van Rijs, F., Jansen, B.F.P., and Crans, W.. In Crans, W., editor, Proc. NASECODE VI, 1989 Google Scholar
[9] Wentinck, H.M.. PhD thesis, Delft University of Technology, 1988.Google Scholar
[10] Könenkamp, R., Muramatsu, S., Matsubara, S., and Shimada, T.. Appl. Phys. Lett., 60 (9): 11201122, 1992.Google Scholar