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Time-resolved in-situ X-ray diffraction study of the formation of 3D-hexagonal mesoporous silica films

Published online by Cambridge University Press:  01 February 2011

D. Grosso ,
P.A. Albouy ,
H. Amenitsch ,
A.R. Balkenende  and
F. Babonneau
D. Grosso
Affiliation:
Chimie de la Matière Condensée, UPMC - CNRS, 4 place Jussieu, 75005 Paris, France
P.A. Albouy
Affiliation:
Lab. de Physique des Solides, Université Paris-Sud, 91405 Orsay, France
H. Amenitsch
Affiliation:
Institute of Biophysics and X-ray Structure Research, Austrian Academy of Sciences, Steyrergasse 17/VI, 8010 Graz, Austria.
A.R. Balkenende
Affiliation:
Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, Netherlands.
F. Babonneau
Affiliation:
Chimie de la Matière Condensée, UPMC - CNRS, 4 place Jussieu, 75005 Paris, France
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Abstract

Highly oriented 3D-hexagonal silica thin films have been produced on silicon substrates by dip-coating technique, using cetyltrimethylammonium (CTAB) bromide as structuring agent. For the first time, time-resolved in situ X-ray diffraction experiments have been used to investigate the formation of such mesostructured films. Interestingly, the data shows that an intermediate mesophase appears just after film deposition (t<500 ms), characterized by one diffraction peak centered at a d spacing of 65 Å. Then after 20 s, another mesophase appears with a shorter d spacing (44 Å), which corresponds to the 3D-hexagonal structure found for the final dried film.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 628: Symposium CC – Hybrid Organic/Inorganic Materials , 2000 , CC6.1
Copyright
Copyright © Materials Research Society 2000

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References

REFERENCES

1. Ying, J. Y., Mehnert, C. P., and Wong, M. S., Angew. Chem. Int. Ed.,, 38, 56 (1999).Google Scholar
2. Yang, H., Coombs, N., Sokolov, I. and Ozin, G. A., Nature,, 381, 549 (1996).Google Scholar
3. Yang, H., Kuperman, A., Coombs, N., Mamiche-Afara, S. and Ozin, G. A., Nature,, 379, 703 (1996).Google Scholar
4. Tolbert, S. H., Shaffer, T. E., Feng, J., Hansman, P. K., and Stucky, G. D., Chem. Mater.,, 9, 1962 (1997).Google Scholar
5. Zhao, D., Yang, P., Margolese, D. I., Chmelka, B. F. and Stucky, G. D., Chem. Commun.,, 2499 (1998).Google Scholar
6. Lu, Y., Ganguli, R., Drewien, C. A., Anderson, M. T., Brinker, C. J., Gong, W., Guo, Y., Soyez, H., Dunn, B., Huang, M. H. and Zink, J. I., Nature,, 389, 364, (1997).Google Scholar
7. Zhao, D., Yang, P., Melosh, N., Chmelka, B. F. and Stucky, G. D., Adv. Mater.,, 10, 1380 (1998).Google Scholar
8. Klotz, M., Ayral, A., Guizard, C., Cot, L., J. Mater. Chem.,, 10, 663 (2000).Google Scholar
9. Brinker, C. J., Lu, Y., Sellinger, A., and Fan, H., Adv. Mater.,, 11, 579 (1999).Google Scholar
10. Ågren, P., Lindén, M., Rosenholm, J.B., Swarzenbacher, R., kriechbaum, M., Amenitsch, H., Laggner, P., Blanchard, J., Schüth, F., J. Phys. Chem. B,, 103, 5943 (1999).Google Scholar
11. O'Brien, S., Francis, R.J., Fogg, A., O'Hare, D., Okasaki, N., Kuroda, K., Chem. Mater., 11, 1822 (1999).Google Scholar
12. Grosso, D., Balkenende, A. R., Albouy, P. A., Lavergne, M., and F. Babonneau J. Mater. Chem. (submitted).Google Scholar
13. Klotz, M., Albouy, P.A., Ayral, A., Ménager, C., Grosso, D., van der Lee, A., Cabuil, V., Babonneau, F., Guizard, C. Chem. Mater. (in press).Google Scholar