Skip to main content Accessibility help
×
Home

Thin Film Synthesis Using Miniature Pulsed Metal Vapor Vacuum arc Plasma Guns

  • X. Godechot (a1), M. B. Salmeron (a1), D. F. Ogletree (a1), J. E. Galvin (a1), R. A. Macgill (a1), M. R. Dickinson (a1), K. M. Yu (a1) and I. G. Brown (a1)...

Abstract

Metallic coatings can be fabricated using the intense plasma generated by the metal vapor vacuum arc. We have made and tested an embodiment of vacuum arc plasma source that operates in a pulsed mode, thereby acquiring precise control over the plasma flux and so also over the deposition rate, and that is in the form of a miniature plasma gun, thereby allowing deposition of metallic thin films to be carried out in confined spaces and also allowing a number of such guns to be clustered together.

The plasma is created at the cathode spots on the metallic cathode surface, and is highly ionized and of directed energy a few tens of electron volts. Adhesion of the film to the substrate is thus good. Virtually all of the solid metals of the Periodic Table can be used, including highly refractory metals like tantalum and tungsten. Films, including multilayer thin films, can be fabricated of thickness from Angstroms to microns. We have carried out preliminary experiments using several different versions of miniature, pulsed, metal vapor vacuum arc plasma guns to fabricate metallic thin films and multilayers.

Here we describe the plasma guns and their operation in this application, and present examples of some of the thin film structures we have fabricated, including yttrium and platinum films of thicknesses from a few hundred Angstroms up to 1 micron and an yttrium-cobalt multilayer structure of layer thickness about 100 Angstroms.

Copyright

References

Hide All
1. Barbee, T. W. Jr.,, Proc. SPIE 563, 3 (1985)
2. Spiller, E., AIP Proc. 75, 125 (1981)
3. Parker, E. H. C., editor, “The Technology and Physics of Molecular Beam Epitaxy”, Plenum Press, New York, 1985
4. Appleton, B. R., Zuhr, R. A., Noggle, T. S., Herbots, N., Pennycook, S. J. and Alton, G. D., MRS Bulletin 12, 52 (1987)
5. Harper, J. M. E., in “Thin Film Processes”, edited by Vossen, J. L. and Kern, W., Academic press, New York, 1978
6. Rebouillat, J. P., Michelutti, B., Souche, Y., Gavigan, J. P., Givord, D. and Lienard, A., in “Growth, Characterization and Properties of Ultrathin Magnetic Films and Multilayers”, (Jonker, B. T., Heremans, J. P. and Marinero, E. E., editors), MRS Symposium Proceedings Vol.151, p. 259 (1989).
7. “Laser Ablation for Thin Film Deposition”, Symposium N, this conference.
8. Falco, C. M., in “Physics, Fabrication, and Applications of Multilayered Structures”, edited by Dhez, P. and Weisbuch, C., Plenum Press, N.Y., 1988.
9. Barbee, T. W. Jr.,, in “Synthetic Modulated Structures”, edited by Chang, L. L. and Geissen, B. C., Academic Press, Orlando, Fla, 1985.
10. Barbee, T. W. Jr.,, Opt. Eng. 25, 898 (1986).
11.Vacuum Arcs - Theory and Application”, edited by Lafferty, J. M., Wiley, New York, 1980.
12. Boxman, R. L., Goldsmith, S., Shalev, S., Yaloz, H. and Brosh, N., Thin Solid Films 139, 41 (1985).
13. Sanders, D. M., ”Review of Ion Based Coating Processes Derived from the Cathodic Arc”, J. Vac. Sci. Tech. A7, 2339 (1989).
14. Bergman, C., in “Ion Plating and Implantation”, edited by Hochman, R. F., American Society for Metals, USA, 1986. (Proceedings of the ASM Conference on Applications of Ion Plating and Implantation to Materials, June 3–5, 1985, Atlanta, GA).
15. Lindfors, P. A., loc. cit. [14].
16. One such manufacturer is Vac-Tec Systems, Inc., Boulder, CO.
17. Lyubimov, G. A. and Rakhovskii, V. I., Sov. Phys. Usp. 21(8), 693 (1978).
18. Brown, I. G., Galvin, J. E., and MacGill, R. A., Appl. Phys. Lett. 47, 358 (1985).
19. Brown, I. G., Galvin, J. E., Gavin, B. F., and MacGill, R. A., Rev. Sci. Instrum. 57, 1069 (1986).
20. Brown, I. G., in “The Physics and Technology of Ion Sources”, Brown, I. G. editor, Wiley, N.Y., 1989.
21. Brown, I. G., Feinberg, B., and Galvin, J. E., J. Appl. Phys. 63, 4889 (1988).
22. Godechot, X. and Brown, I. G., to be published.
23. Sasaki, J. and Brown, I. G., J. Appl. Phys. 66, 5198 (1989).
24. Tuma, D. T., Chen, C. L. and Davies, D. K., J. Appl. Phys. 42, 3821 (1978).
25. Daalder, J. E., Physica 104C, 91 (1981).
26. Aksenov, I. I., Konovalov, I. I., Kudryavtseva, E. E., Kunchenko, V. V., Padalka, V. G. and Khoroshikh, V. M., Sov. Phys. Tech. Phys. 29(8), 893 (1984).
27. Aksenov, I. I., Belous, V. A., Padalka, V.G. and Khoroshikh, V. M., Sov. J. Plasma Phys. 4(4), 425 (1978).
28. Osipov, V. A., Padalka, V. G., Sablev, L. P. and Stupak, R. I., Instrum. and Exp. Techniques 21(6), 173 (1978).
29. Aksenov, I. I., Vakula, S. I., Padalka, V. G., Strelnitski, V. E. and Khoroshikh, V. M., Sov. Phys. Tech. Phys. 25(9), 1164, (1980).
30. Shalev, S. and Boxman, R. L., IEEE Trans. Plasma Sci. PS-14, 59 (1986).
31. Voitsenya, V. S., Gorbanyuk, A. G., Onishchenko, I. N. and Safranov, B. G., Sov. Phys. – Tech. Phys. 9(2), 221 (1964).
32. Aksenov, I. I., Belokhvostikov, A. N., Padalka, V. G., Repalov, N. S. and Khoroshikh, V. M., Plasma Physics and Controlled Fusion 28, 761 (1986)
33. Storer, J., Galvin, J. E. and Brown, I. G., J. Appl. Phys. 66, 5245 (1989).

Thin Film Synthesis Using Miniature Pulsed Metal Vapor Vacuum arc Plasma Guns

  • X. Godechot (a1), M. B. Salmeron (a1), D. F. Ogletree (a1), J. E. Galvin (a1), R. A. Macgill (a1), M. R. Dickinson (a1), K. M. Yu (a1) and I. G. Brown (a1)...

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed