Hostname: page-component-848d4c4894-cjp7w Total loading time: 0 Render date: 2024-06-26T07:57:01.362Z Has data issue: false hasContentIssue false

Thin Film Dispenser Cathodes for Thermionic Micro-Devices

Published online by Cambridge University Press:  21 March 2011

Kevin R. Zavadil
Affiliation:
Materials and Process Science Center, Sandia National Laboratories Albuquerque, NM 87185-0888
Donald B. King
Affiliation:
Nuclear and Risk Technologies Center, Sandia National Laboratories Albuquerque, NM 87185-0888
Get access

Abstract

Electron emissive thin films that possess the thermionic properties of macroscale dispenser cathodes have been fabricated using standard RF sputter deposition techniques. These films are based on a compositionally modulated structure using W and a Ba-containing ternary oxide. These films exhibit uniform work function values of 1.9 to 2.2 eV with high emission coefficients of 2 to 26 A·cm−2K−2. Electron microscopy shows that W layer coalescence and continued particle growth occurs with prolonged annealing, eventually disrupting the original surface layer. Chemical modification of the oxide during deposition may provide a route to limit the extent of W coalescence and preserve surface metallization layers on these films. These films are designed to be integrated into thermionic micro-devices.

Type
Research Article
Copyright
Copyright © Materials Research Society 2002

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Herring, C. and Nichols, M.H., Rev. Mod. Phys., 21(2), 1949, 185270.Google Scholar
2. King, D.B., Zavadil, K.R. and Ruffner, J.A., 35th Intersociety Energy Conversion Engineering Conference Proceedings, American Institute of Aeronautics and Astronautics, July, 2000, 272282.Google Scholar
3. Thomas, R.E., Gibson, J.W., Haas, G.A. and Abrams, R.H., IEEE Trans. Electr. Dev., 37(3), 1990, 850861.Google Scholar
4. Gärtner, G., Geittner, P., Lydtin, H. and Ritz, A., Appl. Surf. Sci.,111(1997) 1117.Google Scholar
5. Zavadil, K.R., King, D.B. and Ruffner, J.A., Space Technology and Applications International Forum 2001, El-Genk, M.S., ed., AIP, Vol. 552, 2001, 11651170.Google Scholar