Hostname: page-component-76fb5796d-9pm4c Total loading time: 0 Render date: 2024-04-26T15:45:48.377Z Has data issue: false hasContentIssue false

Tem Study of Stacking Faults Formed in Pairs in a ZnSe Epitaxial Layer on a GaAs(00l) Buffer Layer

Published online by Cambridge University Press:  21 February 2011

J. Tanimura
Affiliation:
Advanced Technology R&D Center, Mitsubishi Electric Corporation, 1-1, Tsukaguchi-Honmachi 8-Chome, Amagasaki, Hyogo 661, Japan
O. Wada
Affiliation:
Advanced Technology R&D Center, Mitsubishi Electric Corporation, 1-1, Tsukaguchi-Honmachi 8-Chome, Amagasaki, Hyogo 661, Japan
Y. Endoh
Affiliation:
Advanced Technology R&D Center, Mitsubishi Electric Corporation, 1-1, Tsukaguchi-Honmachi 8-Chome, Amagasaki, Hyogo 661, Japan
M. Imaizumi
Affiliation:
Advanced Technology R&D Center, Mitsubishi Electric Corporation, 1-1, Tsukaguchi-Honmachi 8-Chome, Amagasaki, Hyogo 661, Japan
T. Ogama
Affiliation:
Advanced Technology R&D Center, Mitsubishi Electric Corporation, 1-1, Tsukaguchi-Honmachi 8-Chome, Amagasaki, Hyogo 661, Japan
Get access

Abstract

Structure of stacking faults in a ZnSe epitaxial layer grown on a GaAs(001) buffer layer was determined with transmission electron microscopy. Two stacking faults were formed in pairs on (111) and (111) planes with the same polarity and met at a point which is a few atomic layers away from the interface between ZnSe and GaAs. Partial dislocations were found to be the Shockley type ones with a Burgers vector of 1/6<211>. Atomic force microscopy showed that hillocks were formed in pairs at a surface where the pair of stacking faults existed in the layer. Moreover, it was observed that the pair of stacking faults elongated along the <110> direction by gliding on the {111} faulted planes under annealing at 200°C for 30min. Formation mechanisms of the pair of stacking faults have been discussed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Sze, S.M. in semiconductor Devices, Physics and Technology, (Wiley, N.Y., 1985).Google Scholar
2 Matthews, J.W. in Epitaxial Growth, edited byMatthews, J.W., (Academic, N.Y., 1975, Part B), pp.559.Google Scholar
3 Kakibayashi, H., Nagata, F., Katayama, Y. and Shiraki, Y., Jpn.J.Appl.Phys. 23, L846(1984).Google Scholar
4 Mitsuhashi, H., Mitsuhashi, I., Mizuta, M. and Kukimoto, H., Jpn.J.Appl.Phys. 24, L578 (1985).Google Scholar
5 Petruzzello, J., Greenberg, B.L., Cammack, D.A. and Dally, R., J.Appl.Phys. 63, 2299 (1988).Google Scholar
6 Guha, S., Munekata, H., LeGoues, F.K. and Chang, L.L., Appl.Phys.Lett. 60, 3220 (1992).Google Scholar
7 Kuo, L.H., Salamanca-Riba, L., DePuydt, J.M., Cheng, H. and Qiu, J., Philos.Mag. A69, 301 (1994).Google Scholar
8 maizumi, M.I., Endoh, Y., Ohtsuka, K. and Isu, T., Jpn.J.Appl.Phys. 33, 3505 (1994).Google Scholar
9 Endoh, Y., Tanimura, J., maizumi, M.I., Suita, M., Ohtsuka, K., Isu, T. and Nunoshita, M., J.Cryst. Growth, 154, 41 (1995).Google Scholar
10 Tafto, J. and Spence, J.C.H., J.Appl.Cryst. 15, 60 (1982).Google Scholar
11 Muto, S., Takeda, S., Hirata, M., Fujii, K. and Ibe, K., Philos. Mag. A66, 257(1992).Google Scholar
12 De Cooman, B.C. and Carter, C.B., Appl.Phys.Lett. 50, 40(1987).Google Scholar
13 Thomas, G. and Goringe, M.J. in Transmission Electron Microscopy of Materials, (John Wiley & Sons Inc. N.Y., 1979), pp.149.Google Scholar