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TEM and HREM study of silicon and platinum nanoscale ensembles in 3D dielectric opal matrix

  • N. A. Feoktistov (a1), V. G. Golubev (a1), J.L. Hutchison (a2), D. A. Kurdyukov (a1), A. B. Pevtsov (a1), R. Schwarz (a3), J. Sloan (a4) and L.M. Sorokin (a1)...

Abstract

In the present paper regular systems of silicon and platinum assemblies have been fabricated in a three-dimensional (3D) void sublattice of synthetic opal. The detailed TEM and HREM structure study of ‘opal-Si’ and ‘opal-Pt-Si’ composites was carried out. It was found that in regular composites ‘opal-Si’ the silica spheres were covered uniformly with a nanocrystalline silicon layer of up to 25-30 nm in thickness. To form the Pt-Si contact the silica spheres were coated with platinum layer before embedding silicon. The results obtained demonstrate a possibility of creating 3D multilayer semiconductor structure (p-n junctions, Schottky barriers etc.) on the inner surface of opal voids.

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TEM and HREM study of silicon and platinum nanoscale ensembles in 3D dielectric opal matrix

  • N. A. Feoktistov (a1), V. G. Golubev (a1), J.L. Hutchison (a2), D. A. Kurdyukov (a1), A. B. Pevtsov (a1), R. Schwarz (a3), J. Sloan (a4) and L.M. Sorokin (a1)...

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