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Synthetic Diamond, Its Properties and Synthesis

Published online by Cambridge University Press:  25 February 2011

Max N. Yoder*
Affiliation:
Office of Naval Research, Department of the Navy Arlington, Virginia 22217
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Abstract

The synthesis of crystalline diamond in the Soviet Union, Japan, and the United States is reviewed. A comparison of the various growth techniques is presented. Hydrogen and its role in the synthesis process has been controversial; a model is presented illustrating its essential, but limited role. Another controversial aspect of diamond synthesis concerns the nature of the carbon bond in the reactant gas and how this influences the resultant crystal; an heuristic model is provided. Non-thermal equilibrium growth techniques are generic to the recent advances in diamond growth; the separation of the process for the disassociation of the reactant gas from that of the “surface cleaning” and the artificial stimulation of the surface migration velocity may be absolutely necessary for defect-free nucleation and growth. While the various properties of diamond have been known long before the advent of artifact diamond, its potential for use in devices has only recently been modelled and calculated; numerical figures of merit are compared with those of other semiconducting materials. Charge carrier velocity profiles of diamond are compared with those of more conventional semiconductors. Strengths and weaknesses accruing from the diamond velocity profile are addressed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1987

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References

REFERENCES

1. Leipunsny, O., Uspekhli Khimii 8, 1519 (1939)Google Scholar
2. Matsumoto, S., Sato, Y., Kamo, M., and Setaka, N., Jpn. J. Appl. Phys 21, 183 (1982)Google Scholar
3. Kamo, M., Sato, Y., Matsumoto, S., and Setaka, N., J. Cryst. Growth 62, 642 (1983)Google Scholar
4. Kikuchi, M., Shingyochi, T., Yamashita, H., and Nishiyama, A., Japanese patent 84/25767 (14 Feb 1984)Google Scholar
5. Kikuchi, M., Shingyochi, T., Yamashita, H., and Nishiyama, A., Japanese patent 60/41650 (5 Mar 1984)Google Scholar
6. Gordon, M. S. and Caldwell, J. W., J. Chem. Phys. 70, 5503 (1979)Google Scholar
7. Balamuta, J., Golde, M., and Ho, Yueh-Se, J. Chem. Phys. 79, 2822 (1983)Google Scholar
8. Spitsyn, B. V., Bouilov, L. L., and Derjaguin, B. V., J. Cryst. Growth 52, 219 (1981)Google Scholar
9. Pate, B. B., PhD. Thesis, Stanford University (1984); B.B. Pate, Surf. Sci. 165, 83 (1986)Google Scholar
10. Markunas, R. J., presented at the 1986 S.D.I.O./IST - ONR Diamond Technology Initiative Seminar, Durham, N.C. 17 July 1986 (unpublished)Google Scholar
11. Partlow, U.D. and Kline, L. E., Proc. Spring Meeting, Materials Research Society Symposium C: Plasma Processing (1986)Google Scholar
12. Markunas, R. J., presented at the 1987 S.D.I.O./IST - ONR Diamond Technology Initiative Workshop, Lexington, MA 6 Feb 1987 (unpublished)Google Scholar
13. Gels, M. W., presented at the 1986 S.D.I.O./IST - ONR Diamond Technology Initiative Seminar, Durham, N.C. 17 July 1986 (unpublished)Google Scholar
14. Berman, R. and Martinez, M., Diamond Research 7,7 (1976)Google Scholar
15. Burgermelster, E. A., J. Phys. C: 13, L963 (1980)Google Scholar
16. Vandersande, J. W., Phys. Rev. B: 15, 2355 (1977)Google Scholar
17. Burgemeister, E. A. and Ammerlaan, C.A. J., Phys. Rev. B 21 2499 (1980)Google Scholar
18. Ositinskaya, T.D., Vishnevskii, A.S., Tsendrovskli, V.A., and Zhitmetskii, V.I., Sinteticheskie Almazy 4, 7 (1976)Google Scholar
19. Collins, A. T. and Lightowlers, E. C., Phys. Rev. 171, 843 (1968)Google Scholar
20. Vishnevskii, A. S., Gontar, A. G., and Shul'zhenko, A. A., Sov. Phys. Semicond. 12 1162 (1978)Google Scholar
21. Stoneham, A. M., Solid State Commun. 21 339 (1977)Google Scholar
22. Williams, A. W. S., Lightowlers, E. C., and Collins, A. T., J. Phys. C: 3, 1727 (1970)Google Scholar
23. Dean, P. J., Lightowlers, E. C., and Ilight, D. R., Phys. Rev. 140, A352 (1965)Google Scholar
24. Prosser, V., Czech. J. Phys. B 15, 128 (1965)Google Scholar
25. Rauch, C. J., Phys. Rev. Lett. 7, 83 (1961)Google Scholar
26. Koronova, E. A. and Shevchenko, S. A., Soy. Phys. Semicond. 1, 299 (1967)Google Scholar
27. Russell, K. J. and Leivo, W. J., Phys. Rev. B: 6, 4588 (1972)Google Scholar
28. Reggiani, L., Bosl, S., Canali, C., Nava, F., and Kozlov, S. F., Solid State Commun. 30, 333 (1979)Google Scholar
29. Canali, C., Nava, F., Gatti, E., Kozlov, S. F., Manfredi, P. F., Manfredotti, C., and Quirini, A., Nucl. Instrue. Methods 160, 73 (1979)Google Scholar
30. Ferry, D. K., Phys. Rev. B: 12, 2361 (1975)Google Scholar
31. Johnson, A., RCA Rev. 26, 163 (1965)Google Scholar
32. Keyes, R.W., Proc. IEEE 60, 225 (1972)Google Scholar
33. Kurihara, K., Japanese patent 61/108191 A2 86/108191 26 May 1986 Google Scholar