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The Synthesis of Metal Oxide Films from Compound Powder Targets

Published online by Cambridge University Press:  25 February 2011

A.I. Stognij
Affiliation:
Institute of Solid State and Semiconductor Physics, P.Brovka 17, Minsk 220072, USSR
V.V. Tokarev
Affiliation:
Institute of Solid State and Semiconductor Physics, P.Brovka 17, Minsk 220072, USSR
Yu.N. Mitin
Affiliation:
Institute of Solid State and Semiconductor Physics, P.Brovka 17, Minsk 220072, USSR
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Abstract

The paper presents the results of AES, SIMS, RBS and electron microscopy investigation of compound metal oxide films. The films were deposited by sputtering compound targets with oxygen ion beam, extracted from hollow cold cathode ion source.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

1 Stognij, A.I. and Tokarev, V.V., Pribory i Tekhnika Eksperimenta, 3, 142 (1991).Google Scholar
2 Betz, G. and Wehner, G.K., in Sputtering by Particle Bonbardment II, dited by Behrisch, R. (Springer-Verlag, Berlin, 1983),pp. 2498.Google Scholar
3 Andersen, H.H., in Ion Implantation and Beam Processing, eds. Williams, S.S., Poate, J.M. (Acad. Press, Australia, 1984).Google Scholar