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Synthesis of Crystalline Structures of CNx, Thin Films Deposited on Sapphire, Quartz and Alumina Substrates

Published online by Cambridge University Press:  10 February 2011

R Alexandrescu ,
R. Cireasa ,
A. Crunteanu ,
C. S. Cojocaru ,
I. Morjan ,
A. Kumar  and
F. Vasiliu
R Alexandrescu
Affiliation:
National Institute for Lasers, Plasma and Radiation Physics, Lasers Department, P.O.Box MG-36, R-76 900 Bucharest, Romania
R. Cireasa
Affiliation:
National Institute for Lasers, Plasma and Radiation Physics, Lasers Department, P.O.Box MG-36, R-76 900 Bucharest, Romania
A. Crunteanu
Affiliation:
National Institute for Lasers, Plasma and Radiation Physics, Lasers Department, P.O.Box MG-36, R-76 900 Bucharest, Romania
C. S. Cojocaru
Affiliation:
National Institute for Lasers, Plasma and Radiation Physics, Lasers Department, P.O.Box MG-36, R-76 900 Bucharest, Romania
I. Morjan
Affiliation:
National Institute for Lasers, Plasma and Radiation Physics, Lasers Department, P.O.Box MG-36, R-76 900 Bucharest, Romania
A. Kumar
Affiliation:
Department of Electrical Engineering, University of South-Alabama, Mobile, AL 36688, U.S.A.
F. Vasiliu
Affiliation:
National Institute for Materials Physics, Electron Microscopy Laboratory, P.O.Box MG-7, Bucharest, Romania
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Abstract

Carbon nitride films raise current interest for their potential applications as ultrahard materials. We report on the formation of crystalline CN structures in films deposited at 248 nm on different substrates (sapphire, quartz, alumina) using the laser-induced CVD method and a gas mixture containing ethylene/nitrous oxide and ammonia as carbon and nitrogen source, respectively. The structural and morphological properties of the films were characterized by different analytical techniques (SEM, TEM, TED and XPS).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 555: Symposium OO – Properties and Processing of Vapor-Deposited Coatings , 1998 , 413
Copyright
Copyright © Materials Research Society 1999

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