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Synthesis of C-N films by hot carbon filament CVD

Published online by Cambridge University Press:  10 February 2011

Yoshihisa Watanabe
Affiliation:
Department of Materials Science and Engineering, National Defense Academy, 1–10–20 Hashirimizu, Yokosuka, Kanagawa 239, Japan.
Hiroshi Kasai
Affiliation:
Department of Materials Science and Engineering, National Defense Academy, 1–10–20 Hashirimizu, Yokosuka, Kanagawa 239, Japan.
Emi Kawasumi
Affiliation:
Department of Materials Science and Engineering, National Defense Academy, 1–10–20 Hashirimizu, Yokosuka, Kanagawa 239, Japan.
Yoshiki Amamoto
Affiliation:
Department of Materials Science and Engineering, National Defense Academy, 1–10–20 Hashirimizu, Yokosuka, Kanagawa 239, Japan.
Yoshikazu Nakamura
Affiliation:
Department of Materials Science and Engineering, National Defense Academy, 1–10–20 Hashirimizu, Yokosuka, Kanagawa 239, Japan.
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Abstract

Thin films composed of carbon and nitrogen were synthesized by hot-filament chemical vapor deposition method. Deposition method was developed by replacing a filament material from metals to graphite to ascertain two effects; (1) prevention of contamination from the filament material and (2) feasibility of synthesis of hydrogen free films without using hydrocarbon gas such as methane. Films were synthesized from pure nitrogen gas and hot graphite filament. Synthesized films were characterized by Auger electron spectroscopy, Raman spectroscopy, X ray diffraction, atomic force microscopy and nano indentations. It is found that the synthesized films are amorphous with the smooth and uniform surface and show the elastic behavior.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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References

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