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Synthesis and Selected Micro-Mechanical Properties of Titanium Nitride Thin Films by the Pyrolysis of Tetrakis Titanium in Ammonia.

Published online by Cambridge University Press:  15 February 2011

Y. W. Bae
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831–6063
W. Y. Lee
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831–6063
T. M. Besmann
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831–6063
P. J. Blau
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831–6063
L. Riester
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831–6063
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Abstract

Thin films of titanium nitride were chemical vapor deposited on (100)-oriented single-crystal silicon substrates from tetrakis (dimethylamino) titanium, Ti((CH3)2N)4, and ammonia gas mixtures in a cold-wall reactor at 623 K and 655 Pa. The films were characterized by Auger electron spectroscopy, X-ray diffraction, and transmission electron spectroscopy. The nano-scale hardness of the film, measured by nanoindentation, was 12.7±0.6 GPa. The average kinetic friction coefficient against unlubricated, type- 440C stainless steel was determined using a computer-controlled friction microprobe to be ∼0.43.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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