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Synthesis and Radical Polymerization of Pyrocarbonate Functionalized Monomers: Application to Positive-Tone Photoresists

Published online by Cambridge University Press:  10 February 2011

S.O. Vansteenkiste ,
Y. Marleé ,
E.H. Schacht ,
M. Van Damme ,
H. van Aert  and
J. Vermeersch
S.O. Vansteenkiste
Affiliation:
Polymer Materials Research Group, Department of Organic Chemistry, Faculty of Science, University of Gent, Krijgslaan 281 S4bis, B-9000 Gent, Belgium, stefan.vansteenkiste@rug.ac.be
Y. Marleé
Affiliation:
Polymer Materials Research Group, Department of Organic Chemistry, Faculty of Science, University of Gent, Krijgslaan 281 S4bis, B-9000 Gent, Belgium
E.H. Schacht
Affiliation:
Polymer Materials Research Group, Department of Organic Chemistry, Faculty of Science, University of Gent, Krijgslaan 281 S4bis, B-9000 Gent, Belgium
M. Van Damme
Affiliation:
Agfa-Gevaert N.V., Septestraat 27, B-2640 Mortsel, Belgium
H. van Aert
Affiliation:
Agfa-Gevaert N.V., Septestraat 27, B-2640 Mortsel, Belgium
J. Vermeersch
Affiliation:
Agfa-Gevaert N.V., Septestraat 27, B-2640 Mortsel, Belgium
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Abstract

The synthesis of two new tert-butyl carbonic anhydride monomers, 4-vinylbenzoic and methacrylic tert-butyl carbonic anhydride was achieved successfully. Radical polymerization at 45°C yielded tert-butyl pyrocarbonate protected materials. Thermographic analysis showed that both polymers decompose cleanly at 135°C. The lithographic performance of both materials was evaluated in presence of 2,4,6-tris-(trichloromethyl)-s-triazine as photoacid generating species. It was demonstrated that the large polarity change resulted in a chemically amplified positive photoresist system

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 624: Symposium V – Materials Development for Direct Write Technologies , 2000 , 199
Copyright
Copyright © Materials Research Society 2000

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References

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