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Surface Film Softening Effects in Mosi2

Published online by Cambridge University Press:  01 January 1992

C. M. Czarnik ,
R. Gibala ,
M.A. Nastasi ,
R. B. Schwarz ,
S. R. Srinivasan  and
J. J. Petrovic
C. M. Czarnik
Affiliation:
The University of Michigan, Department of Materials Science and Engineering, Ann Arbor, MI 48109-2136
R. Gibala
Affiliation:
The University of Michigan, Department of Materials Science and Engineering, Ann Arbor, MI 48109-2136
M.A. Nastasi
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
R. B. Schwarz
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
S. R. Srinivasan
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
J. J. Petrovic
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
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Abstract

Surface film softening, which is associated with the generation of mobile dislocations at a film-substrate interface and their motion into the substrate, has been demonstrated previously for bcc metals and B2 ordered alloy substrates. MoSi2 exhibits features of limited dislocation mobility and plasticity similar to these materials and would also be expected to exhibit film-enhanced plasticity, but at much higher temperatures. In this investigation, 150 nm thick films of SiO2, MoSi2 and ZrO2 were deposited on MoSi2 substrates by electron beam deposition at ∼50°C in an attempt to observe film softening. In initial experiments, hot hardness testing was utilized primarily to maintain deformation conditions characteristic of dislocation glide. ZrO2-coated MoSi2 demonstrates a large film-induced softening in hardness tests carried out at 0.5 - 1 kgf loads over the temperature range 25 - 1300°C.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 288: Symposium L – High-Temperature Ordered Intermetallic Alloys V , 1992 , 597
Copyright
Copyright © Materials Research Society 1995

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References

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