Hostname: page-component-8448b6f56d-mp689 Total loading time: 0 Render date: 2024-04-25T00:26:06.767Z Has data issue: false hasContentIssue false
  • English
  • Français

Surface Chemistry of GaAs(100) after Treatment with Aqueous H3PO4 Solution

Published online by Cambridge University Press:  22 February 2011

V. A. Burrows  and
V. S. G. Kondapuram
V. A. Burrows
Affiliation:
Arizona State University, Dept. of Chemical, Bio, and Materials Engineering and Center for Solid State Electronics Research, Tempe, AZ 85287–6006
V. S. G. Kondapuram
Affiliation:
Arizona State University, Dept. of Chemical, Bio, and Materials Engineering and Center for Solid State Electronics Research, Tempe, AZ 85287–6006
Get access

Abstract

The interaction of semiconductor surfaces with aqueous acid solutions is important in chemical cleaning and etching. Wet chemical treatments are advantageous because they cause little damage to the surface and do not usually require high temperatures. The surface chemistry of GaAs after treatment with phosphoric acid was studied using multiple internal reflection infrared spectroscopy. The treatment left behind a thin film containing several types of PxOy bonds. The chemical nature of the film was observed to change with time as new species would form on the surface.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 282: Symposium E – Chemical Perspectives of Microelectronic Materials III , 1992 , 117
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Yota, J. and Burrows, V. A., J. Vac. Sci. Technol., A10, 837, (1992).Google Scholar
2. Nakamoto, K., Infrared and Raman Spectra of Inorganic and Coordination Compounds. 3rd. ed., Wiley, New York (1978).Google Scholar
3. Stegner, E., Z. Chemie, 12, 52, (1972).Google Scholar
4. Lynch, C. T., ed., CRC Handbook of Materials Science, Vol 1, CRC Press, Boca Raton, (1974).Google Scholar
5. Windholz, M., ed., The Merck Index, 10th ed., Merck and Co., NJ, (1983).Google Scholar