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Substrate Curvature Change Due to Morphological Instability of a Strained Epitaxial Surface Film

Published online by Cambridge University Press:  10 February 2011

F. Jonsdottir  and
L. B. Freund
F. Jonsdottir
Affiliation:
Hibbitt, Karlsson & Sorensen, Inc., 1080 Main Street, Pawtucket, RI 02860
L. B. Freund
Affiliation:
Division of Engineering, Brown University, Providence, RI 02912
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Abstract

The curvature induced in the substrate of a film-substrate system as a result of an epitaxial mismatch strain in a film of nonuniform thickness is considered. In particular, the change in curvature of the substrate due to a transition in film surface morphology from a fiat to a wavy profile is determined numerically. It is found that the amount of curvature relaxation accompanying the instability is within the resolution of recently refined substrate curvature measurement methodologies.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 441: Thin Films – Structure and Morphology , 1996 , 495
Copyright
Copyright © Materials Research Society 1997

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