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Study of the growth mechanism and properties of InN films grown by MOCVD

  • Abhishek Jain (a1) and Joan M. Redwing (a1)

Abstract

Thin films of InN were grown on (0001) Sapphire by MOCVD. The effect of growth conditions and buffer layer on the film morphology was studied. Growth temperature and TMI flow rate were important factors in the growth of InN. The use of a low temperature AlN buffer layer was also found to improve the morphology and crystal quality of the films. Thin (<40Å) AlN buffer layers produced the best results while polycrystalline InN was obtained when the buffer layer thickness exceeded 60Å. Delamination of the InN films was observed to occur at growth temperature, which limited the thickness of the films to less than 300 nm. A room temperature mobility of 792 cm2/Vs and an electron concentration of 2.1×1019 cm-3 were measured in an approximately 200 nm thick InN layer grown on sapphire.

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1. Properties of Advanced Semiconductor Materials, edited by Levinshtein, Rumyanstev, Shur
2. Inushima, T., Mamutin, V. V., Vekshin, V. A., Ivanov, S. V., Sakon, T., Motokawa, M., Ohoya, S., J. Cryst. Growth 227, 481 (2001)
3. Davydov, V. Yu., Klochikhin, A. A., Seisyan, R. P., Emtsev, V. V., Ivanov, S. V., Bechstedt, F., Furthmüller, J., Harima, H., Mudryi, A. V., Aderhold, J., Semchinova, O. and Graul, J., Phys. Stat. Sol. (b) 229, 3, R1–R3 (2002)
4. Ng, Y. F., Cao, Y. G., Xie, M. H., Wang, X. L. and Tong, S. Y., Appl. Phys. Let. 81 (21), 3960 (2002)
5. Yamaguchi, S., Kariya, M., Nitta, S., Takeuchi, T., Wetzel, C., Amano, H., Akasaki, I., J. Appl. Phys. 85(11), 7682 (1999)
6. Lu, H., Schaff, W., Hwang, J., Wu, H., Koley, G., Eastman, L., Appl. Phys. Let. 79 (10), 1489 (2001)
7. Raghavan, S., Redwing, J., J. Cryst. Growth [in press]
8. Adachi, M., Murakami, Y., Hashimoto, A., Yamamoto, A., Intl. Workshop on Nitride Semiconductors, IPAP Conf. Series 1, 339
9. Kuznia, J., Khan, M., Olson, D., J. of Appl. Phys. 73 (9), 4700 (1993)
10. Amano, H., Akasaki, I., Hiramatsu, K., Koide, N., Sawaki, N., Thin Solid Films 163, 415 (1988)
11. Akasaki, I., Amano, H., Koide, Y., Hirmatsu, K., Sawaki, N., J. Cryst. Growth 98, 209 (1989)
12. Ito, T., Ohtsuka, K., Kuwahara, K., Sumiya, M., Takano, Y., Fuke, S., J. Cryst. Growth 205, 20 (1999)
13. Higashiwaki, M., Matsui, T., J. Cryst. Growth 251, 494 (2003)

Study of the growth mechanism and properties of InN films grown by MOCVD

  • Abhishek Jain (a1) and Joan M. Redwing (a1)

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