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Structure, Composition and Properties of (Pb,La)TiO3 Thin Films by Rf Magnetron Sputtering

Published online by Cambridge University Press:  10 February 2011

C.E. Murhy
Affiliation:
Advanced Technology R&D Center, Mitsubishi Electnc Corporation, Amagasaki, Japan
H. Hata
Affiliation:
Advanced Technology R&D Center, Mitsubishi Electnc Corporation, Amagasaki, Japan
K. Tsutsumi
Affiliation:
Advanced Technology R&D Center, Mitsubishi Electnc Corporation, Amagasaki, Japan
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Abstract

Thin films of lanthanum-doped lead titanate for use in pyroelectric detectors were deposited on Si wafer system substrates by an RF magnetron sputtering method. Deposition was from a ceramic target with excess lead using Ar plus N2O sputter gases. The film structure, composition and electrical properties were examined as a function of substrate temperature during film deposition, Tsub, from 600°C to 750°C. Dense, featureless film cross-sections existed up to Tsub=625°C, while vertical columns, indicative of crystalline material, were present from Tsub=650°C upwards. At Tsub=600°C films were amorphous, but from Tsub=625°C upwards a highly crystalline perovskite phase was found. The tetragonality was very small, c/a˜1.006, indicating the existence of a pseudo-cubic structure. Compared to the idealized chemical formula, Pb1−xLaxTi1−x/4O3, films produced at Tsub<650°C or Tsub>700°C were Pb deficient, while only in the very narrow 650–700°C Tsub range was near-stoichiometry obtained, with a slight lack of Ti. The substrate temperature during deposition is apparently a critical factor in obtaining stoichiometric films. The La content with respect to Pb was 9.5% which would be expected to yield a reasonably tetragonal crystal structure in bulk material, however stress due to the substrate may account for this discrepancy. The relative permittivity, εr, showed a sharp transition from ˜50 at Tsub=600°C to 450–550 between 650°C and 750°C. This behaviour parallels both the microstructural and crystal lattice changes from amorphous to perovskite material. Even though on polycrystalline underlayers, pyroelectric activity, p, was measured on as-deposited films, the polarization being directed into the substrate and a peak of 1.2×10−4Cm−2K−1 appearing at Tsub=700°C. After DC thermal poling, at 100°C with 8V for 20min, p increased dramatically, with Tsub 700°C and 725°C films exhibiting p=2.0×10−4Cm−2K−1. The peak in the poled p value corresponded to the maximum found in the crystal tetragonality and agrees with increasing p as polarization increases from a cubic to tetragonal structure.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

1. Nagao, N., Takeuchi, T. and tijima, K., Jpn. J. Appl. Phys. 32, 4065 (1993)Google Scholar
2. Iijima, K., Takayama, R., Tomita, Y. and Ueda, I., J. Appl. Phys. 60, 2914 (1986)Google Scholar
3. Adachi, H., Mitsuyu, T., Yamazaki, O. and Wasa, K., J. Appl. Phys. 60, 736 (1986)Google Scholar
4. Waser, R., in Ferroelectric Ceramics, edited by Setter, N. and Colla, E. (Birkhauser, Basel, 1993), p. 273298 Google Scholar