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Structural Investigation of Alumina Thin Films Deposited by Chemical Vapor Deposition

Published online by Cambridge University Press:  11 February 2011

Naoufal Bahlawane ,
Sabine Blittersdorf ,
Katharina Kohse-Höinghaus ,
Burak Atakan  and
Jürgen Müller
Naoufal Bahlawane*
Affiliation:
Physikalische Chemie I, Universität Bielefeld, Universitätsstr. 25, D-33615 Bielefeld, Germany
Sabine Blittersdorf
Affiliation:
Physikalische Chemie I, Universität Bielefeld, Universitätsstr. 25, D-33615 Bielefeld, Germany
Katharina Kohse-Höinghaus
Affiliation:
Physikalische Chemie I, Universität Bielefeld, Universitätsstr. 25, D-33615 Bielefeld, Germany
Burak Atakan
Affiliation:
Thermodynamik, Institut für Verbrennung und Gasdynamik, Gerhard-Mercator-Universität, Duisburg, D-47048 Duisburg, Germany
Jürgen Müller
Affiliation:
Lehrstuhl für Werkstoffchemie, RWTH Aachen, D-5256 Aachen, Germany
*
*naoufal@pc1.uni-bielefeld.de
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Abstract

The present study concerns the deposition of α–Al2O3 for diffusion barrier applications on superalloy substrates. The growth of α–Al2O3 has been achieved by chemical vapor deposition (CVD) using an AlCl3/CO2/H2 gas mixture at 1080 °C. Among several growth-controlling parameters with potential importance for the whisker growth process, the reactor pressure during deposition seems to be highly influential on the resulting film structure. Deposited films at low pressure presented solely a fine whisker structure. This non-closed structure is not suitable as diffusion barrier; however, the observed high porosity makes the deposit a potential candidate as a catalysis support. An increase of the deposition pressure led to a competitive growth of whiskers and grains. A suitable microstructure was attained at relatively high pressure (100 mbar) where the surface was fully covered by 2 μm large alumina crystals that formed a closed structure. Further increase of the pressure led to an irregular and rough surface microstructure.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 750: Symposium Y – Surface Engineering 2002–Synthesis, Characterization and Applications , 2002 , Y3.10
Copyright
Copyright © Materials Research Society 2003

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References

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