Skip to main content Accessibility help
×
Home

Structural and Electrical Properties of Titanium-Nickel Films Deposited Onto Silicon Substrates

  • Kathleen R. Collen (a1), Arthur B. Ellis (a1), J. D. Busch (a2) and A. D. Johnson (a2)

Abstract

Thin films of the shape memory alloy NiTi have been sputter-deposited onto ptype silicon substrates. Films that are initially amorphous may be crystallized by vacuum annealing. The crystalline films exhibit the B2->B19′ phase change associated with the shape memory effect while remaining in contact with the silicon substrate. Transition temperatures were determined by resistance measurements and x-ray diffraction. The NiTi - Si contacts are diodes, as evidenced by their current-voltage characteristics; however, the effect of the phase change on the barrier height could not be determined.

Copyright

References

Hide All
1. Collen, K. R.et al., “Principles of the Shape Memory Effect in Nickel-Titanium” in Chemistry of Advanced Materials, ed. by Rao, C.N.R. (Blackwell, in press).
2. Walker, J. A. et al., Sensors and Actuators A, 243 (1989).
3. Jardine, A.P. et al., unpublished results.
4. Berkson, M., Busch, J. D. and Johnson, A.D., these proceedings
5. Collen, K R., Ellis, A. B., Busch, J. D., and Johnson, A.D., in preparation.
6. Michal, G.M. and Sinclair, R., Acta Cryst. B37, 1803 (1981).
7. Norde, H., J. Appl. Phys. 50, 5053 (1979).

Structural and Electrical Properties of Titanium-Nickel Films Deposited Onto Silicon Substrates

  • Kathleen R. Collen (a1), Arthur B. Ellis (a1), J. D. Busch (a2) and A. D. Johnson (a2)

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed