Hostname: page-component-76fb5796d-x4r87 Total loading time: 0 Render date: 2024-04-27T02:42:26.082Z Has data issue: false hasContentIssue false

Steady-State and Transient Electron Transport in ZnO: Recent Progress

Published online by Cambridge University Press:  23 June 2011

Walid A. Hadi
Affiliation:
Department of Electrical and Computer Engineering, University of Windsor, Windsor, Ontario, Canada N9B 3P4
Michael Shur
Affiliation:
Department of Electrical, Computer, and Systems Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180-3590, U.S.A.
Lester F. Eastman
Affiliation:
School of Electrical Engineering, Cornell University, Ithaca, New York 14853 U.S.A.
Stephen K. O’Leary
Affiliation:
School of Engineering, The University of British Columbia, Kelowna, British Columbia, Canada V1V 1V7
Get access

Abstract

We briefly review some recent results on the steady-state and transient electron transport that occurs within bulk wurtzite zinc oxide. These results were obtained using an ensemble semi-classical three-valley Monte Carlo simulation approach. They showed that for electric field strengths in excess of 180 kV/cm, the steady-state electron drift velocity associated with bulk wurtzite zinc oxide exceeds that associated with bulk wurtzite gallium nitride. The transient electron transport that occurs within bulk wurtzite zinc oxide was studied by examining how electrons, initially in thermal equilibrium, respond to the sudden application of a constant electric field. These transient electron transport results demonstrated that for devices with dimensions smaller than 0.1 μm, gallium nitride based devices will offer the advantage, owing to their superior transient electron transport, while for devices with dimensions greater than 0.1 μm, zinc oxide based devices will offer the advantage, owing to their superior high-field steady-state electron transport.

Type
Research Article
Copyright
Copyright © Materials Research Society 2011

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Őzgűr, Ű.,.Alivov, Ya. I., Liu, C., Teke, A., Reshchikov, M. A., Doğan, S., Avrutin, V., Cho, S.-J., and Morkoç, H., J. Appl. Phys. 98, 041301 (2005).Google Scholar
2. Ferry, D. K., Phys. Rev. B 12, 2361 (1975).Google Scholar
3. Albrecht, J. D., Ruden, P. P., Limpijumnong, S., Lambrecht, W. R. L., and Brennan, K. F., J. Appl. Phys. 86, 6864 (1999).Google Scholar
4. Guo, B., Ravaioli, U., and Staedele, M., Comp. Phys. Commun. 175, 482 (2006).Google Scholar
5. Bertazzi, F., Goano, M., and Bellotti, E., J. Electron. Mater. 36, 857 (2007).Google Scholar
6. Furno, E., Bertazzi, F., Goano, M., Ghione, G., and Bellotti, E., Solid-State Electron. 52, 1796 (2008).Google Scholar
7. O’Leary, S. K., Foutz, B. E., Shur, M. S., and Eastman, L. F., Solid State Commun. 150, 2182 (2010).Google Scholar
8. Lugli, P., and Ferry, D. K., IEEE Trans. Electron Devices 32, 2431 (1985).Google Scholar
9. Seeger, K., Semiconductor Physics: An Introduction, 9th ed. (Springer-Verlag, Berlin, 2004).Google Scholar
10. Adachi, S., Properties of Group-IV, III-V, and II-VI Semiconductors (Wiley & Sons, Chichister, 2005).Google Scholar
11. O’Leary, S. K., Foutz, B. E., Shur, M. S., and Eastman, L. F., J. Mater. Sci.: Mater. Electron. 17, 87 (2006).Google Scholar
12. Foutz, B. E., Eastman, L. F., Bhapkar, U. V., and Shur, M. S., Appl. Phys. Lett. 70, 2849 (1997).Google Scholar
13. Foutz, B. E., O’Leary, S. K., Shur, M. S., and Eastman, L. F., J. Appl. Phys. 85, 7727 (1999).Google Scholar