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The Spectroscopy and Surface Chemistry of Metal-Alkyl Molecules

Published online by Cambridge University Press:  25 February 2011

P. Shaw ,
J. O'Neill ,
E. Sanchez ,
Z. Wu  and
R.W. Osgood Jr.
P. Shaw
Affiliation:
Microlectronics Sciences Laboratories, Columbia University, New York, NY 10027
J. O'Neill
Affiliation:
Microlectronics Sciences Laboratories, Columbia University, New York, NY 10027
E. Sanchez
Affiliation:
Microlectronics Sciences Laboratories, Columbia University, New York, NY 10027
Z. Wu
Affiliation:
Microlectronics Sciences Laboratories, Columbia University, New York, NY 10027
R.W. Osgood Jr.
Affiliation:
Microlectronics Sciences Laboratories, Columbia University, New York, NY 10027
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Abstract

metal-alkyl molecules provied an early source molecule for photodeposition of metal. They continue to be of interest for patterned and unpatterned laser deposition and for conctact formation on compound semiconductors. This article provides a brief review of what has been learned about the surface photo-physic of this class of molecules based on several years of study with uV and iR absorption spectroscopy, UHV surface analysis, and thermal and photodesorption amass spectroscopy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 129: Symposium B – Laser and Particle-Beam Modification of Chemical Processes on Surfaces , 1988 , 45
Copyright
Copyright © Materials Research Society 1989

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References

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