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Solid State Reaction of Sputter Deposited Crystalline Multilayers of Ni and Zr

Published online by Cambridge University Press:  26 February 2011

K. M. Unruh ,
W. J. Meng ,
W. L. Johnson ,
A. P. Thakoor  and
S. K. Khanna
K. M. Unruh
Affiliation:
W. M. KECK Laboratory for Engineering Materials, California Institute of Technology, Pasadena, CA 91125
W. J. Meng
Affiliation:
W. M. KECK Laboratory for Engineering Materials, California Institute of Technology, Pasadena, CA 91125
W. L. Johnson
Affiliation:
W. M. KECK Laboratory for Engineering Materials, California Institute of Technology, Pasadena, CA 91125
A. P. Thakoor
Affiliation:
Jet Propulsion Laboratory, California Institute of Technology, Pasadena, CA 91109
S. K. Khanna
Affiliation:
Jet Propulsion Laboratory, California Institute of Technology, Pasadena, CA 91109
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Abstract

We have prepared sputtered metallic films comprised of alternating layers of pure Ni and Zr to a total thickness of several microns. Due to the negative beat of mixing of crystalline Ni and Zr and a significant intermixing rate we have been able to form an amorphous Ni-Zr phase by a solid state reaction. In this work we report the conditions under which a substantial fraction of amorphous material may be formed. The extent of the reaction itself as a function of time has also been monitored.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 37: Symposium D – Layered Structures, Epitaxy, and Interfaces , 1984 , 551
Copyright
Copyright © Materials Research Society 1985

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References

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