Skip to main content Accessibility help
×
Home

Silica Nanosphere Lithography Defined Light Trapping Structures for Ultra-thin Si Photovoltaics

  • Natasa Vulic (a1), Jea-Young Choi (a2), Christiana B. Honsberg (a1) and Stephen M. Goodnick (a1)

Abstract

Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.

Copyright

References

Hide All
[1] Choi, J., Alford, T. L., and Honsberg, C. B., “Fabrication of Periodic Silicon Nanopillar in Two-dimensional Hexagonal Array with Enhanced Control on Structural Dimension and Period,” Langmuir, vol. 0, no. ja, p. null, 2015.
[2] Choi, J., Alford, T. L., and Honsberg, C. B., “Solvent-Controlled Spin-Coating Method for Large-Scale Area Deposition of Two-Dimensional Silica Nanosphere Assembled Layers,” Langmuir, vol. 30, no. 20, pp. 57325738, 2014.
[3] Choi, J., “Development of Nanosphere Lithography Technique for Enhanced Lithographical Accuracy on Periodically Arrayed Si Nanostructure for Thin Si Solar Cell Application,” Arizona State University, Tempe, Arizona, 2015.
[4] Nevière, M. and Popov, E., Light propagation in periodic media: differential theory and design. CRC Press, 2002.
[5] Moharam, M. G. and Gaylord, T. K., “Rigorous coupled-wave analysis of planar-grating diffraction,” JOSA, vol. 71, no. 7, pp. 811818, 1981.
[6] Li, L., “Formulation and comparison of two recursive matrix algorithms for modeling layered diffraction gratings,” JOSA A, vol. 13, no. 5, pp. 10241035, 1996.
[7] Li, L., “New formulation of the Fourier modal method for crossed surface-relief gratings,” JOSA A, vol. 14, no. 10, pp. 27582767, 1997.
[8] Taflove, A., Computational Electrodynamics. 2005.
[9] Oskooi, A. F., Roundy, D., Ibanescu, M., Bermel, P., Joannopoulos, J. D., and Johnson, S. G., “Meep: A flexible free-software package for electromagnetic simulations by the FDTD method,” Comput. Phys. Commun., vol. 181, no. 3, pp. 687702, Mar. 2010.
[10] Green, M. A. and Keevers, M. J., “Optical properties of intrinsic silicon at 300 K,” Prog. Photovoltaics Res. Appl., vol. 3, no. 3, pp. 189192, 1995.

Keywords

Silica Nanosphere Lithography Defined Light Trapping Structures for Ultra-thin Si Photovoltaics

  • Natasa Vulic (a1), Jea-Young Choi (a2), Christiana B. Honsberg (a1) and Stephen M. Goodnick (a1)

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed