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Ruthenium as Schottky metal for SiC-based high temperature hydrogen sensors

Published online by Cambridge University Press:  26 February 2011

S. Basu
Affiliation:
Materials Science Centre, Indian Institute of Technology, Kharagpur 721302, India
S. Roy
Affiliation:
Materials Science Centre, Indian Institute of Technology, Kharagpur 721302, India
C. Jacob
Affiliation:
Materials Science Centre, Indian Institute of Technology, Kharagpur 721302, India
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Abstract

Sensor response characteristics of Ru/3C-SiC (epitaxial layer of SiC on Si substrates) Schottky junctions were studied at different temperatures (200 – 400 °C) in presence of varying concentrations of hydrogen from 5000 – 20000 ppm. The output signal of the sensor, the response time and the reversibility were investigated from the transient response characteristics of the sensors. The sensor parameters improved with higher operating temperature, up to 400 °C. The sensitivity of the sensors was found to be a function of applied bias across the Schottky junction. As compared with the Pd/3C-SiC junctions, the Ru/3C-SiC Schottky sensors showed higher resolution and better reversibility in the hydrogen concentration range 10000 to 20000 ppm. The SIMS (Secondary Ion Mass Spectrometry), RBS (Rutherford Backscattering Spectrometry) and GIXRD (Glancing Incidence X-ray Diffraction) studies indicated that up to 400 °C there was no formation of ruthenium silicide at the Ru/3C-SiC interface.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

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References

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