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RHEED Pole Figure Measurements of Biaxial Thin Film Growth Front Evolution

Published online by Cambridge University Press:  07 March 2011

Gwo-Ching Wang ,
Yu Liu ,
Churamani Gaire ,
Wen Yuan  and
Toh-Ming Lu
Gwo-Ching Wang
Affiliation:
Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute 110, 8th Street, Troy, NY 12180
Yu Liu
Affiliation:
Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute 110, 8th Street, Troy, NY 12180
Churamani Gaire
Affiliation:
Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute 110, 8th Street, Troy, NY 12180
Wen Yuan
Affiliation:
Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute 110, 8th Street, Troy, NY 12180
Toh-Ming Lu
Affiliation:
Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute 110, 8th Street, Troy, NY 12180
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Abstract

The most frequently used characterization technique for biaxial texture formation in thin films is x-ray pole figure analysis. However, x-rays interact weakly with matter and can penetrate a few microns deep into the film. The texture obtained by x-rays is therefore an average texture from the entire thickness of the film. As the texture of a film often changes during growth, information on the basic mechanisms that control the final texture is often lost. In contrast electrons interact strongly with matter and they have very limited penetration and escape depths of a few nm. In this paper we will show how we can use our newly developed reflection high energy electron diffraction (RHEED) surface pole figure technique to probe the surface texture evolution of the growth front from the initial stage (nm thick) to the later stage. The RHEED pole figure technique is a surface-sensitive technique that allows us to obtain information on the dynamic behavior of texture evolution of the growth front during film deposition. We shall explain the principle, measurement, and construction of such RHEED surface pole figures. An example of the biaxial texture evolution of CaF2 due to the atomic shadowing effect during oblique angle deposition is described.

Keywords

RHEEDtexturenanostructure
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1308: Symposium DD – Artificially Induced Crystalline Alignment in Thin Films and Nanostructures , 2011 , mrsf10-1308-dd04-02
Copyright
Copyright © Materials Research Society 2011

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References

REFERENCES

[1]For review see Huang, H., Texture evolution during thin film deposition, in Handbook of Multiscale Materials Modeling, edited by Yip, S. (Springer Science and Business Media 2005), p. 1039.Google Scholar
[2] Freund, Ben, Suresh, Subra, and Freund, L.B., Thin film materials: Stress, defect formation and surface evolution, (Cambridge University Press, 2003).Google Scholar
[3] Ohring, Milton, The materials science of thin films, (Elsevier Science and Technology Books, 2001).Google Scholar
[4] Report, “Nanoscience research for energy needs", DOE BES-cosponsored National Nanotechnology Initiative (NNI) Workshop http://www.sc.doe.gov/bes/reports/list.html March 16-18, 2004.Google Scholar
[5] Parans Paranthaman, M. and Izumi, Teruo, “High performance YBCO-coated supercondcutor wires”, MRS Bulletin August, 533 (2004).Google Scholar
[6] Gaire, C., Clemmer, P.C., Li, H.-F., Parker, T.C., Snow, P., Bhat, I., Lee, S., Wang, G.-C., and Lu, T.-M., J. Cryst. Growth 312, 607 (2010).Google Scholar
[7] Li, H.-F., Snow, P., He, M., Wang, P.-I., Wang, G.-C., and Lu, T.-M., ACS Nano published online http://pubs.acs.org/articlesonrequest/AORftIMt8wMRwxVbPiWaRNG (2010).Google Scholar
[8] Teplin, Charles W., Ginley, David S., and Branz, Howard M., J. of Non-Crystalline Solids 352, 984 (2006).Google Scholar
[9] Yuan, W., Tang, F., Li, H.-F., Parker, T., LiCausi, N., Lu, T.-M., Bhat, I., Wang, G.-C., and Lee, S., Thin Solid Films 517, 6623 (2009).Google Scholar
[10] LiCausi, Nicholas, Yuan, Wen, Tang, Fu, Parker, Thomas, Li, Huafang, Ching Wang, Gwo-, Ming Lu, Toh-, and Bhat, Ishwara, J. of Electronic Materials 38, 1600 (2009).Google Scholar
[11] Findikoglu, Alp T., Choi, Woong, Matias, Vladimir, Holesinger, Terry G., Jia, Quan X., and Peterson, Dean E., Adv. Mater. 17, 1527 (2005).Google Scholar
[12] Selvamanickam, V., Sambandam, S., Sundaram, A., Lee, S., Rar, A., Xiong, X., Alemu, A., Boney, C., and Freundlich, A., J. Cryst. Growth 311, 4553 (2009).Google Scholar
[13] Bauer, E., Growth of oriented films on amorphous surfaces, in Single-Crystal Films Intern. Conf., edited byFrancombe, M. H. and Sato, H. (Oxford: Pergamon Press, Pennsylvania, 1963), p. 43.Google Scholar
[14]For review see Thompson, C.V., Annu. Rev. Mater. Sci. 30, 159 (2000).Google Scholar
[15] Paritosh, , Srolovitz, D.J., Battaile, C.C., Li, X., and Butler, J.E., Acta. Mater. 47, 2269 (1999).Google Scholar
[16] Karpenko, O.P., Bilello, J.C., and Yalisove, S.M., J. Appl. Phys. 82, 1397 (1997).Google Scholar
[17] van der Drift, A., Philips Res. Repts. 22, 267 (1967).Google Scholar
[18] Evans, D.M. and Wilman, H., Acta Cryst. 5, 731 (1952).Google Scholar
[19] Johansen, Christopher G., Huang, Hanchen, and Lu, Toh-Ming, Appl. Phys. Lett. 91, 121914 (2007).Google Scholar
[20] Johansen, Christopher G., Huang, Hanchen, and Lu, Toh-Ming, Computational Materials Science 47, 121 (2009).Google Scholar
[21] Culllity, B.D., Elements of X-ray Diffraction, (Addison-Wesley, 1978).Google Scholar
[22] Tang, F., Wang, G.-C., and Lu, T.-M., J. Appl. Phys. 102, 014306 (2007).Google Scholar
[23] Tang, F., Wang, G.-C., and Lu, T.-M., Appl. Phys. Lett. 89, 241903 (2006).Google Scholar
[24] Tang, F., Parker, T., Wang, G.-C., and Lu, T.-M., Journal of Physics D: Applied Physics 40, R427 (2007).Google Scholar
[25] Helming, K. and Preckwinkel, U., Solid State Phenomena 105, 71 (2005).Google Scholar
[26] Lee, S.L., Windover, D., Doxbeck, M., Nielsen, M., Kumar, A., and Lu, T.-M., Thin Solid Films 377, 447 (2000).Google Scholar
[27] Bunge, H.J. and Klein, H., Zeitschrift Fur Metallkunde 87, 465 (1996).Google Scholar
[28] Ichimiya, A. and Cohen, P.I., Reflection high energy electron diffraction, (Cambridge, 2005).Google Scholar
[29] Braun, W., Applied RHEED: Reflection high energy electron diffraction during crystal growth, (Springer-Verlag, New York, 1999).Google Scholar
[30] Harris, J.J., Joyce, B.A., and Dobson, P.J., Surf. Sci. 103, L90 (1981).Google Scholar
[31] Brewer, R.T., Atwater, H.A., Groves, J.R., and Arendt, P.N., J. Appl. Phys. 93, 205 (2003).Google Scholar
[32] Drotar, Jason T., Lu, T.-M., and Wang, G.-C., J. Appl. Phys. 96, 7071 (2004).Google Scholar
[33] Litvinov, Dmitri and Clarke, Roy, Appl. Phys. Lett. 74, 955 (1999).Google Scholar
[34] Krishnan, R., Liu, Y., Gaire, C., Chen, L., Wang, G.-C., and Lu, T.-M., Nanotechnology 21, 325704 (2010).Google Scholar
[35] Gaire, C., Snow, P., Chan, T.-L., Yuan, W., Riley, M., Liu, Y., Zhang, S.B., Wang, G.-C., and Lu, T.-M., Nanotechnology 21, 445701 (2010).Google Scholar
[36] Li, H.-F., Parker, T., Tang, F., Wang, G.-C., and Lu, T.-M., J. Cryst. Growth 310, 3610 (2008).Google Scholar
[37] Lakhtakia, Akhlesh and Messier, Russell, Sculptured Thin Films: Nanoengineered Morphology and Optics, (SPIE Press, 2005).Google Scholar
[38] Jensen, M. and Brett, M.J., Appl. Phys. A 80, 763 (2005).Google Scholar
[39] Robbie, K. and Brett, M.J., J. of Vacuum Science & Technology A 15(3), 1460 (1997).Google Scholar
[40] Zhao, Y.-P., Ye, D.-X., Wang, G.-C., and Lu, T.-M., Nano Letters 2, 351 (2002).Google Scholar
[41] Wang, Jiang, Huang, Hanchen, Kesapragada, S.V., and Gall, D., Nano Letters 5, 4 (2005).Google Scholar
[42] Alouach, H. and Mankey, G.J., J. Vac. Sci. Technol. A 22, 1379 (2004).Google Scholar
[43] Jensen, M.O. and Brett, M.J., IEEE Trans. on Nanotechnology 4, 269 (2005).Google Scholar
[44] Okamoto, K., J. Appl. Phys. 53, 601 (1982).Google Scholar
[45] Chudzik, M.P., Koritala, R.E., Luo, L.P., Miller, D.J., Balachandran, U., and Kannewurf, C.R., IEEE Trans. Appl. Superconductivity 11, 3469 (2001).Google Scholar
[46] Xu, Y., Lei, C.H., Ma, B., Evans, H., Efstathiadis, H., Rane, M., Massey, M., Balachandran, U., and Bhattacharya, R., Supercond. Sci. Technol. 19, 835 (2006).Google Scholar
[47] Mahieu, S., Ghekiere, P., Depla, D., and De Gryse, R., Thin Solid Films 515, 1229 (2006).Google Scholar
[48] Thompson, K.J., Luhman, D.R., and Hallock, R.B., Surf. Sci. 603, 3249 (2009)Google Scholar