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Rheed Intensity Observation of AlAs and GaAs by in situ Etching Using Arsenic Tribromide

  • T. Kaneko (a1), T. Säger (a1) and K. Eberl (a1)

Abstract

The first in situ layer-by-layer etching of AlAs(100) surfaces has been observed by using RHEED intensity oscillations technique and is contrasted with the results obtained for the etching of GaAs(100). The experiments were conducted by introducing the etchant, arsenic tribromide, directly into a conventional MBE chamber without the use of any carrier gas. RHEED intensity oscillations during the etching of AlAs are observed between 350 and 760°C indicating a continuous increase in the etching rate with temperatures, with no supply rate limiting conditions being reached. Conversely, oscillations from GaAs reveal a reaction rate limited region at low temperatures (≤500°C) and a supply rate limited region at higher temperature(>500°C). The maximum selectivity in the etching rates between GaAs and AlAs is obtained at 450°C (40:1). The selectivity, and the ability to monitor the layer-by-layer process by RHEED intensity oscillations is foreseen to be of great importance for more controlled fabrications of AlAs and GaAs heterointerfaces.

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References

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1. Tsang, W.T., Chiu, T.H. and Kapre, R.M., Appl.Phys.Lett. 63(1993) 3500
2. Tsang, W.T., Chiu, T.H. and Kapre, R.M., J.Crystal Growth 135(1994) 377
3. Kaneko, T., Smilauer, P., Joyce, B.A., Kawamura, T. and Vvedensky, D.D., Phys.Rev.Lett. 174 (1995) 3289
4. Asahi, H., Liu, X.F., Inoue, K., Marx, D., Asami, K., Milci, M. and Gonda, S., J.Crystal Growth 145 (1994) 668

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