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Residual Stress Effects in Ferroelectric Thin Films

Published online by Cambridge University Press:  01 February 2011

T. A. Berfield ,
N. R. Sottos ,
R. J. Ong  and
D. A. Payne
T. A. Berfield
Affiliation:
Department of Theoretical and Applied Mechanics, Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801
N. R. Sottos
Affiliation:
Department of Theoretical and Applied Mechanics, Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801
R. J. Ong
Affiliation:
Department of Materials Science and Engineering and Frederick Seitz Materials Research, Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801
D. A. Payne
Affiliation:
Department of Materials Science and Engineering and Frederick Seitz Materials Research, Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801
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Abstract

Recent developments in soft lithographic patterning enable the integration of functional ceramic thin films on a chip, rather than by adding discrete components to the system. As integrated device applications push the characteristic length scale of materials smaller and smaller, surface and interface effects play an important role, producing significant scientific challenges to the characterization of mechanical properties, performance and reliability. In this paper, we investigate the complex roles of microstructure, interface effects and residual stresses on ferroelectric thin film performance. Pb(Zr0.53Ti0.47)O3 films ranging in thickness from 190 nm to 500 nm were deposited by a sequential build up of sol-gel derived thin layers onto platinized Si substrates. Residual stresses in the films after thermal processing were observed and calculated from laser reflectance measurements of wafer curvature. Field-induced displacements were then measured by interferometric methods for films with well-characterized residual stress states. Results indicate significant increases in film performance with a decrease in measured residual tensile stress.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 784: Symposium C – Ferroelectric Thin Films XII , 2003 , C3.2
Copyright
Copyright © Materials Research Society 2004

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References

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