Hostname: page-component-76fb5796d-9pm4c Total loading time: 0 Render date: 2024-04-27T04:30:14.818Z Has data issue: false hasContentIssue false

Reordering and Crystallization of Silicon Carbide Amorphized by Neutron Irradiation

Published online by Cambridge University Press:  21 March 2011

Lance L. Snead
Affiliation:
Metals and Ceramics Division, ORNL Building 4508 Oak Ridge, TN 37831-6087, USA
Martin Balden
Affiliation:
Max-Planck-Institut für Plasmaphysik Boltzmannstrasse 2 D-85748 Garching bei Munchen, Germany
Get access

Abstract

Densification and crystallization kinetics of bulk SiC amorphized by neutron irradiation is studied. The temperature of crystallization onset of this highly pure, fully amorphous bulk SiC was found to be between 875-885°C and crystallization is nearly complete by 950°C. In-situ TEM imaging confirms the onset of crystallization, though thin-film effects apparently alter the kinetics of crystallization above this temperature. It requires >1125°C for complete crystallization of the TEM foil. Annealing at temperatures between the irradiation and crystallization onset temperature is seen to cause significant densification attributed to a relaxation, or reordering, of the as-amorphized structure.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. McHargue, C. J. and Williams, J. M., Nuclear Instruments and Methods in Physics Research B80/81, 889 (1993).Google Scholar
2. Heera, V., Stoemenos, J., Kogler, R., and Skorupa, W., Journal of Appled Physics 77 (7), 2999 (1995).Google Scholar
3. Wendler, E., Heft, A., and Wesch, W., Nuclear Instruments and Methods in Physics Research B 141, 105 (1998).Google Scholar
4. Snead, L.L. and Hay, J.C., J. Nucl. Mater. 273, 213 (1999).Google Scholar
5. Snead, L.L., Zinkle, S.J., Hay, J.C., and Osborne, M.C., Nucl. Instr. Meth. B141,123 (1998)Google Scholar
6. Bentley, J., Romana, L. J., Horton, L. L., and McHargue, C. J., Material Research Society, Sump. Proc., 235, 363 (1992).Google Scholar
7. Yoshii, K., Suzaki, Y., Takeuchi, A., Yasutake, K., and Kawabe, H., Thin Solid Films, 199, 85 (1991).Google Scholar
8. Bohn, H. G., Williams, J.M., McHargue, C.J., and Begun, G.M.,J.Mater.Res. 2(1),107 (1987).Google Scholar
9. Wendler, E., Heft, A., Wesch, W., Peiter, G., and Dunken, H. H., Nuclear Instruments and Methods in Physics Research B127/128, 341 (1997).Google Scholar
10. Jiang, W., Weber, W. J., Thevuthasan, S., and McCready, D. E., Nuclear Instruments and Methods in Physics Research B 143, 333 (1998).Google Scholar
11. Calcagno, L., Grimaldi, M.G., and Musemeci, P., J. Mater. Res. 12 (7), 1727 (1997).Google Scholar
12. Coffa, S., Priolo, F., Poate, J. M., and Glarum, S. H., Nuclear Instruments and Methods in Physics Research B80/81, 603 (1993).Google Scholar
13. Zammit, U., Madhusoodanan, K. N., Scudieri, F., and Mercuri, F., Phys. Rev. B 49 (3), 2163 (1994).Google Scholar
14. Snead, L. L. and Balden, M.. Results to be published.Google Scholar