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Relationships between the structural, chemical, and mechanical properties of Si-aC:H thin films

Published online by Cambridge University Press:  17 March 2011

Ryan D. Evans ,
Gary L. Doll ,
Philip W. Morrison Jr ,
James Bentley ,
Karren L. More  and
Jeffrey T. Glass
Ryan D. Evans
Affiliation:
Dept. of Chemical Engineering, Case Western Reserve University, 10900 Euclid Ave., Cleveland, Ohio 44106
Gary L. Doll
Affiliation:
Advanced Materials R & D, The Timken Company, 1835 Dueber Ave., S. W., Canton, Ohio 44706
Philip W. Morrison Jr
Affiliation:
Dept. of Chemical Engineering, Case Western Reserve University, 10900 Euclid Ave., Cleveland, Ohio 44106
James Bentley
Affiliation:
Metals and Ceramics Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831
Karren L. More
Affiliation:
Metals and Ceramics Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831
Jeffrey T. Glass
Affiliation:
Dept. of Chemical Engineering, Case Western Reserve University, 10900 Euclid Ave., Cleveland, Ohio 44106
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Abstract

Silicon-incorporated amorphous hydrocarbon (Si-aC:H) films with varying Si contents were deposited onto a Ti interlayer on Si and steel substrates by reactive sputtering in an unbalanced magnetron sputtering system. The objective of this study was to measure and relate the structural, chemical, and mechanical properties of these Si-aC:H films. Transmission electron microscopy revealed that the Si-aC:H phase is amorphous and TiC exists at the Si-aC:H/Ti phase boundary for all compositions. Mechanical properties such as hardness, indentation modulus, and intrinsic stress decreased with increasing Si and H content in the films, for Si/C ≥ 0.04. XPS measurements suggested that this is most likely due to the decreasing presence of a C-C sp3 interlinked network, accompanied by an increase in C-H and Si-H bonds. This conclusion was supported by radial distribution functions obtained using extended electron energy-loss fine structure analysis (EXELFS).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 697: Symposium P – Surface Engineering 2001--Fundamentals and Applications , January 2001 , P7.8
Copyright
Copyright © Materials Research Society 2002

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