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Reflectivity Studies on Adsorbed Block Copolymers Under Shear

Published online by Cambridge University Press:  22 February 2011

Gregory S. Smith
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM
Stephen Wages
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM
Shenda M. Baker
Affiliation:
Harvey Mudd College, Claremont, CA
Chris Toprakcioglu
Affiliation:
University of Patras, Patras, Greece
George Hadziioannou
Affiliation:
University of Groningen, Groningen, Netherlands
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Abstract

We report neutron reflectivity data on (poly)styrene-(poly)ethylene oxide (PS-PEO) diblock copolymers adsorbed onto quartz from the selective solvent deuterated cyclohexane (a non-solvent for PEO and a poor solvent for PS). The PEO "anchor block" adsorbs strongly to form a thin layer on the quartz substrate, while the PS chains dangle into the solvent. We find that under static conditions the density profile of the PS block in a poor solvent can be well described by a Schultz function which is indicative of a polymer "mushroom." Furthermore, we have studied the same system under shear at shear rates from 0-400s-l. We find that there is a dramatic increase in the thickness of the PS layer under shear in cyclohexane and that the relaxation time from the shear-on profile back to the static profile is on the order of several days.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

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