Skip to main content Accessibility help
×
Home

Real-time x-ray scattering study of sputter-deposited LaNiO3 thin films on Si substrates

  • Hsin-Yi Lee (a1), Chih-Hao Lee (a2), Keng S. Liang (a1) and Tai-Bor Wu (a3)

Abstract

Real-time x-ray reflectivity and diffraction measurements under in-situ sputtering deposition conditions were performed to study the crystallization behavior of LaNiO3thin films on Si substrate. We found that an amorphous layer of 60 Å was grown in the first 6 min of the deposition and subsequently a polycrystalline overlayer was developed as observed from the in-situ x-ray reflectivity curves and diffraction patterns. Polycrystalline columnar textures of (110) and (100) were grown on the top of this amorphous film. By comparing the integrated intensities of two Bragg peaks in the plane normal of x-ray diffraction, it was found that the ability of (100)-texturization enhanced with increasing film thickness over a certain critical value.

Copyright

References

Hide All
1 Heartling, G. H., J. Vac. Sci. Technol. A9, 414 (1991).10.1116/1.577424
2 Sayer, M. and Sreenivas, K., Science 247, 105 (1990).10.1126/science.247.4946.1056
3 Sheppard, L. M., Cerarn. Bull. 71, 85 (1992).
4 Larsen, P. K., Cuppens, R. and Spierings, G. A. C. M., Ferroelectrics 128, 265 (1992).10.1080/00150199208015102
5 Bruchhaus, R., Pitzer, D., Eibl, O., Scheithauer, V., and Hoesler, W., Mater. Res. Soc. Symp. Proc. 243, 123 (1992).10.1557/PROC-243-123
6 Jiang, M. C. and Wu, T. B., J. Mater. Res. 9,1879 (1994).10.1557/JMR.1994.1879
7 Scott, J. F. and Araujo, C. A. Paz de, Science 246, 1400 (1989).10.1126/science.246.4936.1400
8 Eom, C. B., Dover, R. B. V., Phillips, J. M., Fleming, R. M., Cava, R. J., Marshall, J. H., Werder, D. J., Chen, C. H., and Fork, D. K.: Ferroelectric Thin Films III, eds. Mayers, E. R., Tuttle, B. A., Desu, S. B., and Larsen, P. K., Mater. Res. Soc. Symp. Proc. 310, 145 (1993).10.1557/PROC-310-145
9 Vijat, D. P. and Desu, S. B., J. Electrochem. Soc. 140, 2640 (1993).
10 Nakamuna, T., Nakao, Y., Kamisawa, A., and Takasu, H., Jpn. J. Appl. Phys. 33, 5207 (1994).10.1143/JJAP.33.5207
11 Ramesh, R., Chan, W. K., Wilkens, B., Gilchrist, H., Sands, T., Tarascon, J. M., Keramidas, V. G., Fork, D. K., Lee, J., and Safari, A., Appl. Phys. Lett. 61, 1537 (1992).10.1063/1.107488
12 Rajeex, K. P., Shivakuma, G. V., and Raychaudhmi, A. K., Solid State Commun. 79, 591 (1991).
13 Satyakahmi, K. M., Mallya, R. M., Ramanathan, K. V., Wu, X. D., Brainard, B., Gautier, D. C., Vasanthacharya, N. Y., and Hegde, M. S., Appl. Phys. Lett. 62, 1233 (1993).
14 Ichinose, H., Nagano, M., Katsuki, H., and Takag, H., J. Mater. Sci. 29, 5115 (1994).10.1007/BF01151105
15 Wold, A., Post, B., and Banks, E., J. Am. Chem. Soc. 70, 4911 (1957).10.1021/ja01575a022
16 Obayashi, H. and Kudo, T., Jpn. J. Appl. Phys. 14, 330 (1975).10.1143/JJAP.14.330
17 Yang, C. C., Chen, M. S., Hong, T. J., Wu, C. M., Wu, J. M., and Wu, T. B., Appl. Phys. Lett. 66, 2643 (1995).10.1063/1.113111
18 Lee, Hsin-Yi, Wu, Tai-Bor, and Lee, Jyh-Fu, J. Appl. Phys. 80 (4), 21752180 (1996).10.1063/1.363109
19 Shyu, M. J., Hong, T. J., nd Wu, T. B., Jpn. J. Appl. Phys. 34, 3647 (1995).10.1143/JJAP.34.3647
20 Chen, M. S., Wu, J. M., and Wu, T. B., Jpn. J. App. Phys. 34, 4870 (1995).10.1143/JJAP.34.4870
21 Chen, M. S., Wu, T. B., and Wu, J. M., J. Appl. Phys. 68, 1430 (1996).
22 Wu, T. B., Hong, T. J., and Jiang, M. C., Mater. Chem. Phys. 36, 337 (1994).10.1016/0254-0584(94)90051-5
23 Lee, Hsin-Yi and Wu, Tai-Bor, J. Mater. Res. 12 (11), 3165 (1997).10.1557/JMR.1997.0413
24 Liu, Y. W., Thesis, M.S. (in Chinese), National Tsing Hua University, 1996.
25 Je, J. H., Noh, D. Y., Kim, H. K., and Liang, K. S., J. Appl. Phys. 81, 6126 (1997).10.1063/1.364394
26 JCPDS 33-710, Wustenberg, H., Hahn, Inst. fur Kristallogr., Techische Hochule, Aachen, Germany, JCPDS Grant-in-Report, 1981.
27 Oh, U. C. and Je, J. H., J. Appl. Phys. 74, 1692 (1993).10.1063/1.355297
28 Tseng, T. F., Yang, C. C., Liu, K. S., Wu, J. M., Wu, T. B., and Lin, I. N., Jpn. J. Appl. Phys. 35, 4743 (1996).10.1143/JJAP.35.4743

Real-time x-ray scattering study of sputter-deposited LaNiO3 thin films on Si substrates

  • Hsin-Yi Lee (a1), Chih-Hao Lee (a2), Keng S. Liang (a1) and Tai-Bor Wu (a3)

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed