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Real Time Study of Cu Diffusion through a Ru Thin Film by Photoemission Electron Microscopy (PEEM)

  • Wayne P. Hess (a1), Gang Xiong (a2), Y.-M. Sun (a3), Alan G. Joly (a4), Kenneth M. Beck (a5), J. M. White (a6) and Wayne P. Hess (a7)...

Abstract

We demonstrate the efficacy of Photoemission Electron Microscopy (PEEM) as a tool to detect metal diffusion processes at nanoscale spatial resolution in real time. For a sample comprising a nominally 1 nm physical vapor-deposited (PVD) Ru thin film covering a thick Cu substrate, we have observed the appearance of bright features on a dark background as the temperature is monotonically increased and irradiated with photons from a Hg arc lamp. These bright features are the result of a lower work function due to Cu diffusion through the Ru film.

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Real Time Study of Cu Diffusion through a Ru Thin Film by Photoemission Electron Microscopy (PEEM)

  • Wayne P. Hess (a1), Gang Xiong (a2), Y.-M. Sun (a3), Alan G. Joly (a4), Kenneth M. Beck (a5), J. M. White (a6) and Wayne P. Hess (a7)...

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