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Real Time Optical Diagnostics in Laser Etching and Deposition

Published online by Cambridge University Press:  26 February 2011

Irving P. Herman ,
Hua Tang  and
Patrick P. Leong
Irving P. Herman
Affiliation:
Department of Applied Physics and the Microelectronics Sciences Laboratories, Columbia University, New York, NY 10027.
Hua Tang
Affiliation:
Department of Applied Physics and the Microelectronics Sciences Laboratories, Columbia University, New York, NY 10027.
Patrick P. Leong
Affiliation:
Department of Applied Physics and the Microelectronics Sciences Laboratories, Columbia University, New York, NY 10027.
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Abstract

Optical probing of laser-assisted chemical reactions on surfaces in real time can help explain and control these processes. Raman microprobe spectroscopy and micro laser induced fluorescence are the two optical probes employed here to investigate several examples of localized laser surface reactions. Raman microprobe analysis is used to monitor in real time the CuCl and CuCl2 products on the surface during local laser etching of copper films by Cl2 and the concomitant loss of the Cu2O passivation layer. It is also used to follow the production of Cu2O during the laser oxidation of Cu. Polarization Raman analysis is utilized to identify and analyze partially molten silicon during laser heating in vacuum and during the etching of silicon by chlorine. Laser induced fluorescence is used as a real time microprobe of desorbed products during local laser-assisted etching of Si and Al surfaces.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 201: Symposium A – Surface Chemistry and Beam-Solid Interactions , 1990 , 563
Copyright
Copyright © Materials Research Society 1991

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