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(Rapid) Thermal Nitridation of SiO2 films

  • J.B. Oude Elferink (a1), F.H.P.M. Habraken (a1) and W.F. van der Weg (a1)

Abstract

In this paper we report on the composition of thermally nitrided silicon dioxide films on silicon. Nitridation temperatures ranging from 950 to 1150ºC and nitridation times ranging from 10 to 240 s were used. The purpose of this study is to reveal the mechanisms involved in the nitridation process with emphasis on the role of hydrogen. From the temperature dependence of the amount of nitrogen in the films the effective activation energy for nitrogen incorporation in this initial stage was deduced.

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[1] Ito, T., Nakumura, T., and Ishikawa, H.. IEEE transactions on Electron devices, 29(1982)498.
[2] Terry, F.L., Aucoin, R.J., Naiman, M.L., and Senturia, S.D.. IEEE electron device letters, 4(1983)191.
[3] Ito, T., Nakumura, T., and Ishikawa, H.. Journal of the Electrochemical Society, 129(1982)184.
[4] Tsai, H.-H., Wu, L.-C., Wu, C.-Y., and Hu, C.. IEEE electron device letters, 8(1987)143.
[5] Pan, P.. Journal of applied physics, 61(1987)264.
[6] Dunselman, C.P.M., Bik, W.M. Arnold, Habraken, F.H.P.M., and Weg, W.F. van der. MRS Bulletin, XII–6(1987)35.
[7] Koba, R. and Tressler, R.E.. Journal of the Electrochemical Society, 135(1988)144.
[8] Habraken, F.H.P.M., Kuiper, A.E.T., Tamminga, Y., and Theeten, J.B.. Journal of applied physics, 53(1982)6996.
[9] Kuiper, A.E.T., Willemsen, M.F.C., Theunissen, A.M.L., Wijgert, W.M.v.d., Habraken, F.H.M.P., Tijhaar, R.H.G., Weg, W.F.v.d., and Chen, J.T.. Journal of appliedphysics, 59(1986)2765.
[10] Morrow, B.A., Cody, I.A., and Lydia Lee, S.M.. The journal of physical chemistry, 79(1975)2405.
[11] Vasquez, R.P. and Madhukar, A.. Journal of applied physics, 60(1986)234.
[12] Kuiper, A.E.T., Willemsen, M.F.C., Mulder, J.M.L., Elferink, J.B. Oude, Habraken, F.H.P.M., and Weg, W.F. van der. To be published in Journal of Vacuum Science and Technology, june 1989.

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(Rapid) Thermal Nitridation of SiO2 films

  • J.B. Oude Elferink (a1), F.H.P.M. Habraken (a1) and W.F. van der Weg (a1)

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