Hostname: page-component-7479d7b7d-68ccn Total loading time: 0 Render date: 2024-07-12T03:22:55.789Z Has data issue: false hasContentIssue false
  • English
  • Français

Pulsed Laser Deposition of ZnO Thin Films for Piezoelectric Applications

Published online by Cambridge University Press:  16 February 2011

E.P. Donovan ,
J.S. Horwitz ,
C.A. Carosella ,
R.C.Y. Auyeung ,
D.B. Chrisey  and
J.G. Smits
E.P. Donovan
Affiliation:
Naval Research Laboratory, Code 6672, Surface Modification Branch, 4555 Overlook Ave SW, Washington, D.C. 20375-5345
J.S. Horwitz
Affiliation:
Naval Research Laboratory, Code 6672, Surface Modification Branch, 4555 Overlook Ave SW, Washington, D.C. 20375-5345
C.A. Carosella
Affiliation:
Naval Research Laboratory, Code 6672, Surface Modification Branch, 4555 Overlook Ave SW, Washington, D.C. 20375-5345
R.C.Y. Auyeung
Affiliation:
Sachs Freeman Associates, 1401 McCormick Dr., Landover, MD 20785
D.B. Chrisey
Affiliation:
Naval Research Laboratory, Code 6672, Surface Modification Branch, 4555 Overlook Ave SW, Washington, D.C. 20375-5345
J.G. Smits
Affiliation:
Boston University, Department of Electrical Engineering, 44 Cumming St., Boston MA 02215
Get access

Abstract

Transparent, insulating ZnO thin films have been deposited in-situ by pulsed laser deposition (PLD) from sintered targets. Films were deposited on substrates of fused quartz, <0001> A12O3, polycrystalline and textured (111) Au, at several substrate deposition temperatures (TSubstrate ≤ 700° C) and background oxygen pressures (P ≤ 300 mTorr). Film structure, morphology and electrical properties were characterized by X-ray diffraction, Rutherford backscattering spectrometry, optical properties were characterized by infrared transmission and reflection, and electrical resistivity was measured normal to the films. Films were crystalline, phase pure, and c-axis oriented. ZnO films deposited onto fused quartz and <0001> sapphire showed x-ray rocking curve full width at half maxima of 5° and 0.34°, respectively. The structure of ZnO films deposited on (111) textured Au was sensitive to the degree of texturing in the Au. The resistivity of PLD ZnO films was 61-63 kΩcm which was a factor of three improvement over sputter deposited films. Deposition of Au by both PLD and IBAD showed a negative correlation between the crystalline texturing and film adherence.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 360 , 1994 , 395
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

references

1] Brook, R.J., Cahn, R.W. and Bever, M.B., Concise Encyclopedia of Advanced Ceramic Materials, (1991) Pergamon Press, OxfordGoogle Scholar
2] Hutson, A.R., Phys. Rev. Lett. 4, 505 (1960)Google Scholar
3] Pol, F. C. M. Van de, Ceramic Bulletin 69 1959–1965 (1990)Google Scholar
4] Smits, J.G. and Choi, W.-S., Proc. 1994 IEEE International Control Symp. 139 (1994) IEEE cat. # 94CH3446-2Google Scholar
5] Tjhen, W, Tamagawa, T., Ya, C.-P., Hsueh, C.-C., Schiller, P., and Polla, D.L. IEEE #91CH2957-9Google Scholar
6] Chrisey, D.B. and Hubler, G.K., Pulsed Laser Deposition of Thin Films (1994) John Wiley and Sons, Inc., New YorkGoogle Scholar
7] Ianno, N.J., McConville, L., Shaikh, N., Pittal, S. and Snyder, P.G., Thin Solid Films 220 92 (1992)Google Scholar
8] Amirhaghi, S., Craciun, V., Beech, F., Vickers, M., Tarling, S., Barnes, P. and Boyd, I.W., Mat. Res. Soc. Symp. Proc. 285 489 (1993)Google Scholar
9] Craciun, V., Elders, J., Gardeniers, J.G.E. and Boyd, I.W., Appl. Phys. Lett. 65, (1994)Google Scholar
10] Smidt, F.A.Int. Mat. Rev. 35, 61 (1990)Google Scholar
11] Hirvonen, J.K., Mat. Sci. Rep. 6, 215 (1991)Google Scholar
12] Chu, W.-K., Mayer, J.W. and Nicolet, M.-A., Backscattering Spectrometry, (1978) Academic Press, LondonGoogle Scholar
13] available from Computer Graphics Services, Ithaca, NYGoogle Scholar
14] Kushida, K. and Takeuchi, H., J. Appl. Phys. 56 1133 (1984)Google Scholar
15] Martin, P.J., Sainty, W.G., and Netterfield, R.P., Vacuum 35, 621 (1985)Google Scholar
16] Hu, J. and Gordon, R.G., Solar Cells 30, 437 (1991)Google Scholar