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Pulsed Laser Deposition of Collagen Thin Films

Published online by Cambridge University Press:  15 February 2011

J. A. Conklin ,
C. M. Cotell ,
T. W. Barnett  and
D. C. Hansen
J. A. Conklin
Affiliation:
US Naval Research Laboratory, Washington, DC 20375
C. M. Cotell
Affiliation:
US Naval Research Laboratory, Washington, DC 20375
T. W. Barnett
Affiliation:
US Naval Research Laboratory, Washington, DC 20375
D. C. Hansen
Affiliation:
US Naval Research Laboratory, Washington, DC 20375
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Abstract

Thin films of collagen were prepared by pulsed laser deposition (PLD) at room temperature on Si substrates using a KrF laser (248 nm) over a fluence range from 0.2–1.5 Jcm-2. The effects on film composition and morphology of ambient gas (Ar, Ar/H2O vapor), quenching atmosphere (Ar, Ar/H2O vapor), and fluence were examined. Fourier transform infrared spectroscopy (FT- IR) demonstrated that, independent of deposition parameter, the PLD films contained the characteristic Amide I and II functionalities of the collagen target and indicated that the secondary structure was altered by the PLD process. The surface morphology of the films was a function of the laser fluence and the gas environment during either film deposition or quenching at the end of deposition. Preliminary gel electrophoresis examination of deposited films suggested the collagen had not maintained the triple helical structure of the native collagen. X-Ray diffraction (XRD) indicated that all of the films, deposited under any conditions, were predominantly amorphous.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 414: Symposium Z – Thin Films and Surfaces for Bioactivity and Biomedical Applications , 1995 , 65
Copyright
Copyright © Materials Research Society 1996

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