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Pulsed Laser Deposition of Aluminum Tris-8-hydroxyquinline and TPD Thin Films

  • Kenji Ebihara (a1), Pail-Kyun Shin (a1), Tamiko Ohshima (a1), Hiroshi Kurihara (a1), Tomoaki Ikegami (a1), Toshihisa Yamaguchi (a2) and Takamasa Sakai (a2)...


Thin films of low molecular weight electroluminescence (EL) materials, Alq3 (aluminum tirs-8-hydoroxyquinline), TPD (N,N'-diphenyl-N,N'-bis (3methylphenyl)-(1,1'-biphenyle)-4, 4'-diamine) were deposited by pulsed laser ablation (PLA) method using KrF excimer laser and Nd:YAG laser. Optical absorption property, surface morphology and photoluminescence of the films were investigated. Alq3 films by Nd:YAG laser show slight absorption at around 400 nm, and TPD films by either KrF laser or Nd:YAG laser showed absorption at 320 nm and 360 nm. It was found that TPD thin films for EL devices can be deposited by PLAmethod usig Nd:YAG laser.



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