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Properties of Ti1-xAlxN Deposited Using Dual Rotatable Magnetrons for Automotive Glass Privacy Coatings

  • T. S. Morley (a1), B. N. Vyletel (a1), R. L. Crawley (a2) and K. E. Nietering (a2)

Abstract

Optically thin films of Ti1-xAlxN were sputter deposited using dual rotatable cathodes in nitrogen and argon-nitrogen environments. The sputtering parameters and film properties were analyzed to develop predictive techniques for possible feedback control during deposition. Also, it was found that feedback control during deposition was suitable for controlling film composition in some magnet configurations.

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