Hostname: page-component-8448b6f56d-jr42d Total loading time: 0 Render date: 2024-04-25T04:09:35.577Z Has data issue: false hasContentIssue false

Properties of PTO/YBCO Heterostructure on Bare SiC Substrates

Published online by Cambridge University Press:  10 February 2011

M. Duan
Affiliation:
Dept. of Electronics, Royal Institute of Technology, Electrum 229, S-164 40, Stockholm, SWEDEN
J. Linnros
Affiliation:
Dept. of Electronics, Royal Institute of Technology, Electrum 229, S-164 40, Stockholm, SWEDEN
C. S. Petersson
Affiliation:
Dept. of Electronics, Royal Institute of Technology, Electrum 229, S-164 40, Stockholm, SWEDEN
K. V. Rao
Affiliation:
Dept. of Condensed Matter Physics, Royal Institute of Technology, S-100 44, Stockholm, SWEDEN
Get access

Abstract

The lead titanium oxide PbTiO3 (PTO) and High Tc Superconductor YBa2Cu3O7-x (YBCO) capacitor hetero structures have been fabricated by pulsed laser ablation directly on 3C-SiC substrates. X-ray diffraction analysis indicates that both PTO layer and YBCO layer are polycrystalline with a perovskite phase. The zero-field cooling (ZFC) curve of YBCO shows a transition temperature Tc around 60 K with a ΔTc ≈ 10 K in a dc SQUID measurement. The ferroelectric properties of the capacitors were characterized by a RT66A apparatus.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Ferroelectric Thin Films, edited by Myers, E. R. and Kingan, A. (Mater. Res. Soc. Proc. 200, Pittsburgh, PA 1990).Google Scholar
2. Scott, J. F., Kammerdimer, L., Parris, M., Trayner, S., Ottenbacher, V., Shawabke, A., and Oliver, W. F., J. Appl. Phys. 64, 787 (1988).Google Scholar
3. Moazzami, Reza, Semicond. Sci. Technol. 10, 375 (1995).Google Scholar
4. Moazzami, R., Hu, C. and Shepherd, W. H., IEEE Trans. Electron Devices, ED–39, 2044(1992).Google Scholar
5. Shepherd, W. H. in Ferroelectric Thin Films, edited by Myers, E. R. and Kingan, A. (Mat. Res. Soc. Symp. Proc. 200, 1990) p. 277.Google Scholar
6. Ramesh, R., Inam, A., Chan, W. K., Tillerot, F., Wilkens, B., Chang, C. C., Sands, T., Tarascon, J. M. and Keramidas, V. G., Appl. Phys. Lett., 59, 3542(1991).Google Scholar
7. Lee, J., Safari, A. and Pfeffer, R. L., Appl. Phys. Lett., 61, 1643(1992).Google Scholar
8. Ramesh, R., Sands, T. and Keramidas, V. G., Appl. Phys. Lett., 63, 731 (1993).Google Scholar
9. Wu, Nai Juan, Ignatiev, Alex, Mesarwi, Abdul-Wahab, Lin, He, Xie, Kan and Shih, Hung-Dah, Jpn. J. Appl. Phys. 32, 5019(1993).Google Scholar