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Properties and Effects of Laser-Induced Plasma During Evaporative Deposition of Thin Films

Published online by Cambridge University Press:  25 February 2011

H. Sankur ,
J. Denatale  and
W. J. Gunning
H. Sankur
Affiliation:
Rockwell International Science Center, 1049 Camino Dos Rios, Thousand Oaks, CA 91360
J. Denatale
Affiliation:
Rockwell International Science Center, 1049 Camino Dos Rios, Thousand Oaks, CA 91360
W. J. Gunning
Affiliation:
Rockwell International Science Center, 1049 Camino Dos Rios, Thousand Oaks, CA 91360
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Abstract

The properties of plasmas generated by the interaction of a pulsed CO2 laser with several solid evaporation targets were studied and the films deposited from such plasmas were characterized. A large flux (˜ 1014/cm2/s) of ions at high velocities (2 − 10 × 106 cm/s) was measured in these plasmas. ZrO2 thin films deposited by laser-assisted evaporation on room temperature substrates had crystalline-oriented structures. Low optical absorption and high refractive index values (2.15 at 632.8 nm) indicated the stoichiometric and dense nature of these films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 93: Symposium C – Materials Modification and Growth Using Ion Beams , 1987 , 287
Copyright
Copyright © Materials Research Society 1987

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References

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