Skip to main content Accessibility help

Progress and Challenges for Chemical Mechanical Polishing of Gallium Nitride

  • Hideo Aida (a1) (a2), Toshiro Doi (a2), Tsutomu Yamazaki (a2), Hidetoshi Takeda (a1) and Koji Koyama (a1)...


Progress and challenges for chemical mechanical polishing (CMP) of GaN are discussed in detail by focusing on the importance of GaN surface oxidation during CMP. We report on the significant difference in the removal rates between Ga2O3 and GaN, suggesting that the surface oxidation reaction is the rate-limiting step for CMP of Ga-faced GaN. This is actually proved by the fact that ex-situ surface oxidation by annealing in air prior to CMP exhibits a marked reduction in the required CMP time to produce a damage-free surface. As a future challenge, we outline two of our recent developments, ultraviolet-assisted CMP and atmosphere-controlled CMP, that enable in-situ oxidation, since ex-situ oxidation must be modified to in-situ to further advance CMP.



Hide All
1. Nakamura, S., Mukai, T. and Senoh, M., Appl. Phys. Lett. 64, 1687 (1994).
2. Khan, M. A., Kuznia, J. N., Olson, D. T., Schaff, W. J., Burm, J. W. and Shur, M. S., Appl. Phys. Lett. 65, 1121 (1994).
3. Nakamura, S., Senoh, M., Iwasa, N. and Nagashima, S., Jpn. J. Appl. Phys. 34, L797 (1995).
4. Pearton, S. J., Zolper, J. C., Shul, R. J. and Ren, F., J. Appl. Phys. 86, 1 (1999).
5. Fujikane, M., Inoue, A., Yokogawa, T., Nagao, S. and Nowak, R., Phys. Status Solidi C 7, 1798 (2010).
6. Aida, H., Takeda, H., Koyama, K., Katakura, H., Sunakawa, K. and Doi, T., J. Electrochem. Soc. 158, H1206 (2011).
7. Aida, H., Doi, T., Takeda, H., Katakura, H., Kim, S.-W., Koyama, K., Yamazaki, T. and Uneda, M., Curr. Appl. Phys. 12, S41 (2012).
8. Preston, F. W., J. Soc. of Glass Tech. 11, 214 (1927).
9. Sadakuni, S., Murata, J., Yagi, K., Sano, Y., Arima, K., Hattori, A., Okamoto, T. and Yamauchi, K., Mater. Sci. Forum 645, 795 (2010).
10. Aida, H., Nishiguchi, K., Takeda, H., Aota, N., Sunagawa, K. and Yaguchi, Y., Jpn. J. Appl. Phys. 47, 8506 (2008).
11. Readinger, E. D., Wolter, S. D., Waltemyer, D. L., Delucca, J. M., Mohney, S. E., Prenitzer, B. I., Giannuzzi, L. A. and Molnar, R. J., J. Electron. Mater. 28, 257 (1999).
12. Xu, X. F., Zhang, R., Chen, P., Zhu, Y. G., Chen, Z. Z., Xie, S. Y., Li, W. P. and Zheng, Y. D., Proc. Int. Conf. Solid-State and Integrated-Circuit Technology 2, 1205 (2001).
13. Hanser, D., Tutor, M., Preble, E., Williams, M., Xu, X., Tsvetkov, D. and Liu, L., J. Cryst. Growth 305, 372 (2007).
14. Aida, H., Takeda, H., Aota, N., Kim, S.-W. and Koyama, K., Sens. Mater. 25, 189 (2013).
15. Ohira, S. and Arai, N., Phys. Status Solidi C 5, 3116 (2008).
16. Vanleugenhaghe, C., de Zoubov, N. and Pourbaix, M. in Atlas of Electrochemical Equilibria in Aqueous Solutions, edited by Pourbaix, M., (National Association of Corrosion Engineers, Houston, 1974) p. 428.
17. Tavernier, P. R., Margalith, T., Coldren, L. A., DenBaars, S. P. and Clarke, D. R., Electrochem. Solid-State Lett. 5, G61 (2002).
18. Bardwell, J. A., Webb, J. B., Tang, H., Fraser, J. and Moisa, S., J. Appl. Phys. 89, 4142 (2001).
19. Zhuang, D. and Edgar, J. H., Mater. Sci. Eng. R 48, 1 (2005).
20. Doi, T., Philipossian, A. and Ichikawa, K., Electrochem. Solid-State Lett. 7, G158 (2004).
21. Doi, T. K., Watanabe, S., Doy, H., Sakurai, S. and Ichikawa, D., Int. J. Manufacturing Sci.. & Technol. 9, 5 (2007).
22. Doi, T. K., Yamazaki, T., Kurokawa, S., Umezaki, Y., Ohnishi, O., Akagami, Y., Yamaguchi, Y. and Kishii, S., Adv. Sci. Technol. 64, 65 (2011).
23. Kitamura, K., Doi, T. K., Kurokawa, S., Umezaki, Y., Matsukawa, Y., Ooki, Y., Hasegawa, T., Koshiyama, I., Ichikawa, K. and Nakamura, Y., Key Engineering Mater. 447-448, 61 (2010).


Related content

Powered by UNSILO

Progress and Challenges for Chemical Mechanical Polishing of Gallium Nitride

  • Hideo Aida (a1) (a2), Toshiro Doi (a2), Tsutomu Yamazaki (a2), Hidetoshi Takeda (a1) and Koji Koyama (a1)...


Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed.