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Preparation of the CrO2 thin films using a Cr8O21 precursor

  • Y. Muraoka (a1) (a2), K. Iwai (a1), S. Yoshida (a1), T. Wakita (a1), M. Hirai (a1) (a2), T. Yokoya (a1) (a2), Y. Kato (a3), T. Muro (a3) and Y. Tamenori (a3)...

Abstract

We have prepared a CrO2 thin film by chemical vapor deposition from a Cr8O21 precursor and studied the bulk and surface physical properties. The CrO2 thin film is grown on TiO2(100) substrate by heating precursor and TiO2 (100) substrate together in a sealed quartz tube. The prepared film is found from x-ray diffraction analysis to be an (100)-oriented single phase. The magnetization and resistivity measurements indicate that the film is a ferromagnetic metal with a Curie temperature of about 400 K. Cr 3s core-level and valence band photoelectron spectroscopy spectra reveal the presence of a metallic CrO2 in the surface region of the film. Our work indicates that preparation from a Cr8O21 precursor in a closed system is promising for obtaining a CrO2 thin film with the metallic surface.

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Keywords

Preparation of the CrO2 thin films using a Cr8O21 precursor

  • Y. Muraoka (a1) (a2), K. Iwai (a1), S. Yoshida (a1), T. Wakita (a1), M. Hirai (a1) (a2), T. Yokoya (a1) (a2), Y. Kato (a3), T. Muro (a3) and Y. Tamenori (a3)...

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